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    • China tantalum carbon;TaC;epitaxial growth;tantalum carbide coating;;wafer carrier;wafer carriers semiconductor;wafer holder;sic epitaxy;LPE; Manufacturers, Suppliers, Factory

    Semicorex has been producing tantalum carbon;TaC;epitaxial growth;tantalum carbide coating;;wafer carrier;wafer carriers semiconductor;wafer holder;sic epitaxy;LPE; for many years and is one of the professional tantalum carbon;TaC;epitaxial growth;tantalum carbide coating;;wafer carrier;wafer carriers semiconductor;wafer holder;sic epitaxy;LPE; manufacturers and Suppliers in China. Once you buy our advanced and durable products which supply bulk packing, we guarantee the large quantity in quick delivery. Over the years, we have provided customers with customized service. Customers are satisfied with our products and excellent service. We sincerely look forward to becoming your reliable long-term business partner! Welcome to buy products from our factory.

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    • ICP Silicon Carbon Coated Graphite

      ICP Silicon Carbon Coated Graphite

      Semicorex's ICP Silicon Carbon Coated Graphite is the ideal choice for demanding wafer handling and thin film deposition processes. Our product boasts superior heat and corrosion resistance, even thermal uniformity, and optimal laminar gas flow patterns.
    • SiC Plate

      SiC Plate

      SiC Plate from Semicorex is an indispensable tool for any manufacturer in the LED industry looking to optimize their ICP etching processes. With its exceptional material properties, precision engineering, and ease of integration, our SiC Plate is the ideal choice for enhancing efficiency and product quality. Trust Semicorex to deliver the solutions you need to stay at the forefront of the semiconductor industry.*
    • Al2O3 Cutting Blade

      Al2O3 Cutting Blade

      Semicorex Al2O3 Cutting Blade,has been meticulously engineered to meet the rigorous demands of cutting processes across a spectrum of industries, including but not limited to film and foil, medical applications, and the intricate assembly of electronic components.**
    • Tantalum Carbide Halfmoon Part

      Tantalum Carbide Halfmoon Part

      Semicorex Tantalum Carbide Halfmoon Part is a crucial component utilized in the semiconductor epitaxy process, a critical stage in the manufacturing of semiconductor devices. Semicorex is committed to providing quality products at competitive prices, we look forward to becoming your long-term partner in China*.
    • TaC Coating Wafer Chuck

      TaC Coating Wafer Chuck

      Semicorex TaC Coating Wafer Chuck stands as the pinnacle of innovation in the semiconductor epitaxy process, a critical phase in semiconductor manufacturing. With our commitment to delivering top-quality products at competitive prices, we are poised to be your long-term partner in China.*
    • LPE Halfmoon Reaction Chamber

      LPE Halfmoon Reaction Chamber

      Semicorex LPE Halfmoon Reaction Chamber is indispensable for the efficient and reliable operation of SiC epitaxy, ensuring the production of high-quality epitaxial layers while reducing maintenance costs and increasing operational efficiency. **
    • Related Blog
    • Reviews

    • Plasma Processes in CVD Operations

      Chemical Vapor Deposition (CVD) refers to a process technology where multiple gaseous reactants at varied partial pressures undergo a chemical reaction under specific temperature and pressure conditions. The resulting solid substance deposits on the surface of the substrate material, thereby obtaining the desired thin film. In traditional integrated circuit manufacturing processes, the obtained thin film materials are generally compounds such as oxides, nitrides, carbides, or materials like polycrystalline silicon, amorphous silicon, etc.

    • The first 6-inch Gallium Oxide substrate industrialization company

      Recently, our company announced that the company has successfully developed a 6-inch Gallium Oxide single crystal using the casting method, becoming the first domestic industrialized company to master the 6-inch Gallium Oxide single crystal substrate preparation technology.

    • What is CVD process in semiconductor?

      Chemical vapor deposition CVD refers to the introduction of two or more gaseous raw materials into a reaction chamber under vacuum and high temperature conditions, where the gaseous raw materials react with each other to form a new material, which is deposited on the wafer surface.

    • Substrate vs. Epitaxy: Key Roles in Semiconductor Manufacturing

      ​In the realms of semiconductor technology and microelectronics, the concepts of substrates and epitaxy hold significant importance. They play critical roles in the manufacturing process of semiconductor devices. This article will delve into the differences between semiconductor substrates and epitaxy, covering their definitions, functions, material structures, and application areas.

    • What is quartz?

      Quartz (SiO₂) material is very similar to glass at first glance, but the special thing is that the general glass is made up of many components (such as quartz sand, borax, boric acid, barite, barium carbonate, limestone, feldspar, soda ash, etc.), while the quartz contains only SiO₂ components, and the microstructure of its silicon dioxide tetrahedral structural units composed of a simple network.

    • What is Electrostatic Chuck(ESC)?

      In semiconductor manufacturing, the precision and stability of the etching process are paramount. One critical factor in achieving high-quality etching is ensuring that wafers are perfectly flat on the tray during the process.

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