During processing, semiconductor wafers must be heated in specialized furnaces. The reactor comprises elongated, cylindrical tubes, in which wafers are positioned on the wafer boats at predetermined, equidistant.In order to survive the processing conditions within the chamber, and to minimize waste to the wafers from the processing equipment, the wafer boats and many other devices used in wafer processing are fabricated of a material such as silicon carbide (SiC).
The boats, loaded with a batch of wafers to be processed, are positioned on long cantilevered paddles, by which they may be inserted into and withdrawn from the tubular furnaces and reactors. The paddles include a flattened carrier section upon which one or more boats may be positioned, and a long handle, positioned at one end of the flattened carrier section, by which the paddle can be handled.
Cantilever paddle is recommended to using recrystallized silicon carbide with a CVD SiC thin layer, which is high purity and best choice for the components in semiconductor processing.
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