Susceptor with Grid

Semicorex Susceptor with Grid is a specialized component used in the epitaxial growth process of semiconductor wafers. This critical piece of equipment is designed to carry and support the wafers during the deposition of materials in a Metal-Organic Chemical Vapor Deposition (MOCVD) system. The Susceptor with Grid plays a pivotal role in ensuring uniform and controlled growth of epitaxial layers on the semiconductor wafer.

The Susceptor with Grid is constructed with materials optimized for its function. In this case, it is made of MOCVD SiC (Metal-Organic Chemical Vapor Deposition Silicon Carbide) coated graphite. This choice of materials provides several advantages, including high-temperature resistance, chemical stability, and excellent thermal conductivity. The SiC coating on the graphite enhances the susceptor's durability and resistance to the harsh conditions encountered during the epitaxial growth process.

The Susceptor with Grid structure serves as a support mechanism for the semiconductor wafers. It is strategically designed to hold the wafers securely in place while allowing for the efficient flow of gases and uniform deposition of materials. The grid pattern helps distribute heat and reactants evenly across the wafer surface, contributing to the precise control of epitaxial layer thickness and composition.

Semicorex Susceptor with Grid is a critical component in the manufacturing process of advanced semiconductor devices. Its robust construction and specialized design make it an essential tool for achieving high-quality epitaxial growth, ensuring the production of semiconductors with superior performance and reliability.