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GaN-on-SiC Substrate
  • GaN-on-SiC SubstrateGaN-on-SiC Substrate
  • GaN-on-SiC SubstrateGaN-on-SiC Substrate
  • GaN-on-SiC SubstrateGaN-on-SiC Substrate
  • GaN-on-SiC SubstrateGaN-on-SiC Substrate
  • GaN-on-SiC SubstrateGaN-on-SiC Substrate

GaN-on-SiC Substrate

Semicorex graphite susceptor engineered specifically for epitaxy equipment with high heat and corrosion resistance in China. Our GaN-on-SiC Substrate susceptors have a good price advantage and cover many of the European and American markets. We look forward to becoming your long-term partner in China.

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Product Description

GaN-on-SiC Substrate wafer carriers used in thin film deposition phases or wafer handling processing must endure high temperatures and harsh chemical cleaning. Semicorex supplies high-purity SiC coated GaN-on-SiC Substrate susceptor provides superior heat resistance, even thermal uniformity for consistent epi layer thickness and resistance, and durable chemical resistance. Fine SiC crystal coating provides a clean, smooth surface, critical for handling since pristine wafers contact the susceptor at many points across their entire area.

At Semicorex, we focus on providing high-quality, cost-effective products to our customers. Our GaN-on-SiC Substrate susceptor has a price advantage and is exported to many European and American markets. We aim to be your long-term partner, delivering consistent quality products and exceptional customer service.


Parameters of GaN-on-SiC Substrate Susceptor

Main Specifications of CVD-SIC Coating

SiC-CVD Properties

Crystal Structure

FCC β phase

Density

g/cm ³

3.21

Hardness

Vickers hardness

2500

Grain Size

μm

2~10

Chemical Purity

%

99.99995

Heat Capacity

J·kg-1 ·K-1

640

Sublimation Temperature

2700

Felexural Strength

MPa (RT 4-point)

415

Young’ s Modulus

Gpa (4pt bend, 1300℃)

430

Thermal Expansion (C.T.E)

10-6K-1

4.5

Thermal conductivity

(W/mK)

300


Features of GaN-on-SiC Substrate Susceptor

- Both the graphite substrate and silicon carbide layer have good density and can play a good protective role in high temperature and corrosive working environments.

- Silicon carbide coated susceptor used for single crystal growth has a very high surface flatness.

- Reduce the difference in thermal expansion coefficient between the graphite substrate and silicon carbide layer, effectively improve the bonding strength to prevent cracking and delamination.

- Both the graphite substrate and silicon carbide layer have a high thermal conductivity, and excellent heat distribution properties.

- High melting point, high temperature oxidation resistance, corrosion resistance.





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