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    • China gallium arsenide Manufacturers, Suppliers, Factory

    Semicorex has been producing gallium arsenide for many years and is one of the professional gallium arsenide manufacturers and Suppliers in China. Once you buy our advanced and durable products which supply bulk packing, we guarantee the large quantity in quick delivery. Over the years, we have provided customers with customized service. Customers are satisfied with our products and excellent service. We sincerely look forward to becoming your reliable long-term business partner! Welcome to buy products from our factory.

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    • Crucible for Monocrystalline Silicon

      Crucible for Monocrystalline Silicon

      Semicorex is committed to manufacturing and supplying Crucible for Monocrystalline Silicon that features exceptional purity, superior thermal properties, mechanical strength, and compatibility with established growth methods, making it indispensable for meeting the stringent demands of the electronics and solar industries.**
    • SiC Coating Graphite Substrate Wafer Carriers for MOCVD

      SiC Coating Graphite Substrate Wafer Carriers for MOCVD

      You can rest assured to buy SiC Coating Graphite Substrate Wafer Carriers for MOCVD from our factory. At Semicorex, we are a large-scale manufacturer and supplier of SiC Coated Graphite Susceptor in China. Our product has a good price advantage and covers many of the European and American markets. We strive to provide our customers with high-quality products that meet their specific requirements. Our SiC Coating Graphite Substrate Wafer Carrier for MOCVD is an excellent choice for those looking for a high-performance carrier for their semiconductor manufacturing process.
    • AlN Ceramic Crucible

      AlN Ceramic Crucible

      Designed to withstand extreme conditions, the AlN Ceramic Crucible presented by Semicorex is an indispensable tool for professionals working with non-ferrous metals and semiconductor materials like gallium arsenide.
    • SiC Wafer Transfer Hand

      SiC Wafer Transfer Hand

      Semicorex SiC Wafer Transfer Hand stands as a cornerstone of automation within the semiconductor manufacturing process, serving as a sophisticated robotic tool for the precise and efficient handling of semiconductor wafers. Semicorex is committed to providing quality products at competitive prices, we look forward to becoming your long-term partner in China.
    • Silicon Epitaxial Deposition In Barrel Reactor

      Silicon Epitaxial Deposition In Barrel Reactor

      If you need a high-performance graphite susceptor for use in semiconductor manufacturing applications, the Semicorex Silicon Epitaxial Deposition In Barrel Reactor is the ideal choice. Its high-purity SiC coating and exceptional thermal conductivity provide superior protection and heat distribution properties, making it the go-to choice for reliable and consistent performance in even the most challenging environments.
    • ICP Silicon Carbon Coated Graphite

      ICP Silicon Carbon Coated Graphite

      Semicorex's ICP Silicon Carbon Coated Graphite is the ideal choice for demanding wafer handling and thin film deposition processes. Our product boasts superior heat and corrosion resistance, even thermal uniformity, and optimal laminar gas flow patterns.
    • Related Blog
    • Reviews

    • The Study on the Distribution of Electrical Resistivity in n-Type 4H-SiC Crystals

      4H-SiC, as a third-generation semiconductor material, is renowned for its wide bandgap, high thermal conductivity, and excellent chemical and thermal stability, making it highly valuable in high-power and high-frequency applications.

    • What is CVD process in semiconductor?

      Chemical vapor deposition CVD refers to the introduction of two or more gaseous raw materials into a reaction chamber under vacuum and high temperature conditions, where the gaseous raw materials react with each other to form a new material, which is deposited on the wafer surface.

    • What is a MOCVD system?

    • GaN Industry Applications

      The application areas of SiC-based and Si-based GaN are not strictly separated. In GaN-On-SiC devices, the cost of SiC substrate is relatively high, and with the growing maturity of SiC long crystal technology, the cost of the device is expected to fall further, and it is used in power devices in the field of power electronics.

    • What is CMP Process

      In semiconductor manufacturing, atomic-level flatness is usually used to describe the global flatness of the wafer, with the unit of nanometers (nm).

    • TSMC: 2nm process risk trial production next year

      In their newly released annual report, TSMC Chairman Deyin Liu and CEO Chieh-Jia Wei revealed the progress related to the 2nm process.

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