Alumina Ceramic Robotic Arm

Semicorex Alumina Ceramic Robotic Arm, also known as wafer handling ceramic robotic arm or ceramic silicon wafer handling fork, is a high-performance semiconductor equipment component. Its design takes into account the stringent requirements of semiconductor manufacturing. With its high temperature resistance, wear resistance, chemical stability, and excellent electrical insulation properties, the alumina ceramic arm plays an irreplaceable role in the global semiconductor manufacturing industry. We at Semicorex are dedicated to manufacturing and supplying high-performance Alumina Ceramic Robotic Arm that fuse quality with cost-efficiency.**

Send Inquiry

Product Description

Semicorex Alumina Ceramic Robotic Arm is widely applicable in various areas within the semiconductor industry, including silicon wafer handling, processing of sensitive electronic components, and operations in high-temperature and corrosive environments, the alumina ceramic wafer handling robotic arm stands as a versatile and essential tool for ensuring efficient and precise handling tasks in semiconductor manufacturing facilities.

The Alumina Ceramic Robotic Arm presents exceptional heat resistance up to 1650°C that ensures reliable operation in high-temperature environments, making it ideal for processes requiring elevated temperatures such as sintering and annealing, where thermal stability is paramount.

On the other hand, its wear resistance not only extends the operational lifespan of the Alumina Ceramic Robotic Arm but also ensures consistent performance even in demanding and abrasive handling environments, reducing maintenance requirements and downtime in semiconductor manufacturing facilities. Furthermore, its exceptional resistance to chemical corrosion makes the Alumina Ceramic Robotic Arm suitable for applications where exposure to corrosive substances is inevitable, providing long-lasting durability and reliability in harsh chemical environments commonly encountered in semiconductor processing.

In addition, the non-conductive properties of the Alumina Ceramic Robotic Arm prevent static interference when handling sensitive electronic components, safeguarding against electrostatic discharge (ESD) that could potentially damage delicate semiconductor devices, ensuring the integrity and functionality of electronic circuits during handling operations.

And along with the optimized geometric design, featuring multiple mounting holes and two elongated handles, not only facilitates easy installation and integration with other machinery but also enhances precision and accuracy in wafer handling tasks, enabling seamless operation in semiconductor manufacturing processes that demand high levels of control and repeatability.

Last but not least, the smooth surface treatment minimizes friction of the Alumina Ceramic Robotic Arm, enhancing the overall efficiency and reliability of the handling process, promoting smoother movement and reducing the risk of damage to delicate components during transfer, contributing to improved yield and quality in semiconductor production.