RTP Ring

Semicorex RTP Ring is a SiC-coated graphite ring, engineered for high-performance applications in Rapid Thermal Processing (RTP) systems. This product is crucial for semiconductor manufacturing, specifically during the RTP stage, where precise and uniform heating is essential for processes like annealing, doping, and oxidation. The RTP Ring’s design ensures superior thermal conductivity, chemical resistance, and mechanical strength, making it a reliable solution for high-temperature processes in semiconductor device production.

Key Features:

SiC Coating for Enhanced Durability

The RTP Ring is coated with a layer of silicon carbide (SiC), a material known for its outstanding thermal stability and chemical resistance. This coating provides the ring with enhanced durability, allowing it to withstand the extreme conditions of RTP processes. The SiC layer also significantly reduces the wear and tear typically caused by high-temperature exposure, ensuring a longer service life compared to uncoated graphite components.

High Thermal Conductivity

Graphite is an excellent conductor of heat, and when combined with the SiC coating, the RTP Ring delivers exceptional thermal conductivity. This enables uniform heat distribution, which is vital for precise temperature control during rapid thermal processing. Uniform heating improves the quality and consistency of semiconductor wafers, leading to better performance in final devices.

Chemical and Thermal Resistance

The SiC coating protects the graphite core from reactive gases and harsh chemicals commonly encountered during RTP, such as oxygen, nitrogen, and various dopants. This protection prevents corrosion and degradation of the ring, allowing it to maintain structural integrity even under challenging chemical environments. Furthermore, the SiC coating ensures the ring can withstand the high temperatures typically required in RTP applications without degradation, offering both resistance to oxidation and excellent high-temperature strength.

Customization Options

Semicorex offers the RTP Ring with various customization options to suit specific process requirements. Custom sizes and shapes are available to accommodate different RTP chamber configurations and wafer handling systems. The company can also tailor the thickness of the SiC coating based on customer needs, ensuring optimal performance and longevity for specific applications.

Improved Process Efficiency

The RTP Ring enhances process efficiency by providing precise and uniform heat distribution across semiconductor wafers. The improved thermal control helps reduce thermal gradients and minimize defects during the thermal treatment stages of wafer processing. This leads to better yield rates and higher quality finished products, contributing to lower production costs and improved throughput.

Low Contamination Risk

The SiC-coated graphite ring helps to minimize contamination risks during semiconductor processing. Unlike other materials, SiC does not release particulate matter, which could potentially interfere with the delicate semiconductor wafers during thermal treatment. This feature is particularly critical in cleanroom environments where contamination control is of utmost importance.

Applications in RTP:

The RTP Ring is primarily used in the Rapid Thermal Processing stage of semiconductor manufacturing, which involves heating wafers to high temperatures in a very short period to achieve precise material modifications. This stage is crucial for processes such as:

• Annealing: RTP is commonly used for the annealing of doped wafers to repair crystal damage and activate dopants. The SiC-coated graphite RTP Ring ensures uniform heat distribution, which is critical for achieving consistent annealing results.
• Oxidation and Diffusion: During oxidation or diffusion processes, the RTP Ring’s high thermal conductivity and chemical resistance help to facilitate the uniform growth of oxide layers and dopant diffusion, ensuring precise layer control and wafer quality.
• Doping: In doping processes, the RTP Ring plays a key role in maintaining the necessary temperature stability, which is essential for achieving the desired doping profiles in the semiconductor material.
• Activation of Dopants: The rapid temperature ramp-up and cooling capability of RTP systems, coupled with the SiC-coated graphite ring’s thermal efficiency, enable precise dopant activation, which is vital for tailoring the electrical properties of semiconductor materials.

Advantages Over Other Materials:

Compared to traditional graphite rings or other coated components, the SiC-coated graphite RTP Ring offers several advantages. Its SiC coating not only extends the operational life of the component but also ensures superior performance in terms of heat resistance and thermal conductivity. Graphite-based components without SiC coatings may experience faster degradation in harsh thermal cycles, leading to more frequent replacements and potentially higher operational costs. Additionally, the SiC coating reduces the need for periodic maintenance, enhancing the overall efficiency of semiconductor processing.

Moreover, the SiC coating prevents the release of contaminants during high-temperature processing, a common problem with uncoated graphite. This ensures a cleaner process environment, which is essential for the high-precision demands of semiconductor manufacturing.

Semicorex RTP Ring – SiC Coated Graphite Ring is a high-performance component designed for use in Rapid Thermal Processing systems. With its excellent thermal conductivity, high thermal and chemical resistance, and customizable features, it is an ideal solution for demanding semiconductor processes. Its ability to maintain precise temperature control and extend component life significantly enhances process efficiency, reduces contamination risks, and ensures consistent, high-quality semiconductor manufacturing. By choosing Semicorex SiC-coated graphite RTP Ring, manufacturers can achieve superior results in their RTP processes, enhancing both the efficiency and quality of their production.