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  • Veeco K475

    • China Veeco K475 Manufacturers, Suppliers, Factory

    Semicorex has been producing Veeco K475 for many years and is one of the professional Veeco K475 manufacturers and Suppliers in China. Once you buy our advanced and durable products which supply bulk packing, we guarantee the large quantity in quick delivery. Over the years, we have provided customers with customized service. Customers are satisfied with our products and excellent service. We sincerely look forward to becoming your reliable long-term business partner! Welcome to buy products from our factory.

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      High Purity Quartz Bell Jar

      Designed to offer unparalleled performance in extreme conditions, Semicorex High Purity Quartz Bell Jar combines exceptional material properties to meet the stringent demands of semiconductor manufacturing.**
    • TaC Coated Wafer Susceptor

      TaC Coated Wafer Susceptor

      Semicorex TaC Coated Wafer Susceptor is a crucial component used in Metal-Organic Chemical Vapor Deposition (MOCVD) furnaces for semiconductor epitaxial (epi) processing. Semicorex is committed to providing quality products at competitive prices, we look forward to becoming your long-term partner in China.
    • SiC Wafer Inspection Chucks

      SiC Wafer Inspection Chucks

      Semicorex SiC Wafer Inspection Chucks are critical enablers for advanced semiconductor manufacturing, addressing the increasing demands for precision, cleanliness, and throughput. Their superior material properties translate to tangible benefits throughout the wafer fabrication process, ultimately contributing to higher yields, improved device performance, and lower overall manufacturing costs. We at Semicorex are dedicated to manufacturing and supplying high-performance SiC Wafer Inspection Chucks that fuse quality with cost-efficiency.**
    • MOCVD Waferholder

      MOCVD Waferholder

      Semicorex MOCVD Waferholder is an indispensable component for SiC epitaxy growth, offering superior thermal management, chemical resistance, and dimensional stability. By choosing Semicorex's waferholder, you enhance the performance of your MOCVD processes, leading to higher quality products and greater efficiency in your semiconductor manufacturing operations. *
    • Batch Wafer Boat

      Batch Wafer Boat

      Semicorex provides wafer boats, pedestals, and custom wafer carriers for both vertical / column and horizontal configurations. We have been manufacturer and supplier of silicon carbide coating film for many years. Our Batch Wafer Boat has a good price advantage and cover most of the European and American markets. We look forward to becoming your long-term partner in China.
    • PBN Heaters

      PBN Heaters

      Semicorex PBN Heaters boast a sophisticated triple-layered design engineered to redefine performance benchmarks. At its core lies a foundation crafted from high-purity pyrolytic boron nitride (PBN), renowned for its exceptional thermal conductivity and robust structural integrity. we look forward to becoming your long-term partner in China.
    • Related Blog
    • Reviews

    • CVD process for SiC wafer epitaxy

      The CVD process for SiC wafer epitaxy involves the deposition of SiC films onto a SiC substrate using a gas-phase reaction. The SiC precursor gases, typically methyltrichlorosilane (MTS) and ethylene (C2H4), are introduced into a reaction chamber where the SiC substrate is heated to a high temperature (usually between 1400 and 1600 degrees Celsius) under a controlled atmosphere of hydrogen (H2).

    • Tantalum carbide coatings in semiconductor industry

      The development of high-powered blue and UV LEDs has enabled the creation of full-color LED TV displays, as well as white LED automotive and domestic lighting. These LEDs are based on Gallium Nitride, which is deposited on substrate wafers supported by CVD SiC-coated graphite susceptor using the MOCVD process.

    • Plasma Processes in CVD Operations

      Chemical Vapor Deposition (CVD) refers to a process technology where multiple gaseous reactants at varied partial pressures undergo a chemical reaction under specific temperature and pressure conditions. The resulting solid substance deposits on the surface of the substrate material, thereby obtaining the desired thin film. In traditional integrated circuit manufacturing processes, the obtained thin film materials are generally compounds such as oxides, nitrides, carbides, or materials like polycrystalline silicon, amorphous silicon, etc.

    • Understanding Chemical Vapor Deposition (CVD): A Comprehensive Overview

      Chemical Vapor Deposition (CVD) is a versatile thin-film deposition technique widely employed in the semiconductor industry for fabricating high-quality, conformal thin films on various substrates. This process involves chemical reactions of gaseous precursors onto a heated substrate surface, resulting in the formation of a solid thin film. This article delves into the intricacies of CVD, exploring its mechanisms, advantages, limitations, and key applications in semiconductor manufacturing.

    • What is SiC epitaxy?

      Silicon Carbide (SiC) epitaxy is a key technology in the field of semiconductors, particularly for the development of high-power electronic devices. SiC is a compound semiconductor with a wide bandgap, which makes it ideal for applications that require a high-temperature and high-voltage operation.

    • What is CVD for SiC

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