English
Home > Products > Silicon Carbide Wafer Tray

China Silicon Carbide Wafer Tray Manufacturers, Suppliers, Factory

We have now our possess revenue group, design staff, technical crew, QC team and package group. We now have strict excellent regulate procedures for each process. Also, all of our workers are experienced in printing subject for Silicon Carbide Wafer Tray,Etch Carrier(ICP/PSS),Single Wafer Susceptors,Graphite Wafer Susceptors,Semiconductor Graphite, we could solve our customer problems asap and do the profit for our customer. For those who need superior provider and excellent , pls choose us , thanks !
Silicon Carbide Wafer Tray, We strive for excellence, constant improvement and innovation, is committed to make us the "customer trust" and the "first choice of engineering machinery accessories brand" suppliers. Choose us, sharing a win-win situation!

Related Products

Hot Products

  • Porous Graphite Crucible

    Porous Graphite Crucible

    Semicorex provide high-quality porous graphite crucible with customized service, our porous graphite material is top-notch quality with high specifications. Semicorex is committed to providing quality products at competitive prices, we look forward to becoming your long-term partner in China.
  • Spare Parts in Epitaxial Growth

    Spare Parts in Epitaxial Growth

    Semicorex Spare Parts in Epitaxial Growth are crucial components utilized within epitaxial growth systems, particularly in processes involving quartz tube setups. These parts play a vital role in facilitating gas flow to drive tray base rotation and ensure precise temperature control throughout the epitaxial growth process. Semicorex is committed to providing quality products at competitive prices, we look forward to becoming your long-term partner in China.
  • TaC-Coating Crucible

    TaC-Coating Crucible

    Semicorex TaC-Coating Crucible has emerged as an essential tool in the pursuit of high-quality semiconductor crystals, enabling advancements in material science and device performance. The TaC-Coating Crucible's unique combination of properties makes them ideally suited for the demanding environments of crystal growth processes, offering distinct advantages over traditional materials.**
  • SiC Boats

    SiC Boats

    Semicorex SiC boats are high-performance silicon carbide ceramic wafer holders designed for precision and durability in diffusion processes. Choose Semicorex for unmatched quality, industry expertise, and tailored solutions that optimize your manufacturing efficiency.*
  • AlN Heaters

    AlN Heaters

    Semicorex AlN heaters are advanced ceramic-based heating elements designed for high-performance thermal applications. These heaters offer exceptional thermal conductivity, electrical insulation, and resistance to chemical and mechanical stress, making them ideal for demanding industrial and scientific applications. AlN heaters provide precise and uniform heating, ensuring efficient thermal management in environments requiring high reliability and durability.*
  • SSIC Sealing Rings

    SSIC Sealing Rings

    With superb hardness, excellent wear resistance, remarkable high-temperature resistance and strong chemical stability, SSIC sealing rings have become an irreplaceable sealing solution in modern machining processes. It can be fully compatible with challenging complex working conditions such as high temperature, high pressure and strong corrosion.
  • Related Blog
  • Reviews

  • Introducing core technology of graphite boat

    Graphite Boat, stands at the forefront of technological innovation in its industry, featuring a suite of groundbreaking advancements designed to enhance performance, purity, and lifespan. Below, we delve into the core technologies that define graphite boat's excellence:

  • Silicon Carbide Wafer Epitaxy Technology

    Silicon Carbide generally uses the PVT method, with a temperature of more than 2000 degrees, a long processing cycle, and low output, so the cost of Silicon Carbide substrates is very high.

  • How to do CMP Process

    In the process of silicon wafer manufacturing, after the crystal rod is cut into silicon wafers, it will need to be polished and cleaned to obtain a single crystal silicon wafer like a mirror.

  • Gallium Nitride Epitaxial Wafers: An Introduction to the Fabrication Process

    Gallium Nitride (GaN) epitaxial wafer growth is a complex process, often utilizing a two-step method. This method involves several critical stages, including high-temperature baking, buffer layer growth, recrystallization, and annealing. By meticulously controlling the temperature throughout these stages, the two-step growth method effectively prevents wafer warping caused by lattice mismatch or stress, making it the predominant fabrication method for GaN epitaxial wafers globally.

  • Substrate and Epitaxy

    In the process of wafer preparation, there are two core links: one is the preparation of the substrate, and the other is the implementation of the epitaxial process. The substrate, a wafer carefully made of semiconductor single crystal material, can be directly put into the wafer manufacturing process as a basis to produce semiconductor devices, or further enhance the performance through the epitaxial process.

  • Nearly $840 Million: Onsemi Acquires a SiC Company

    Today, Onsemi announced on its official website that it has reached an agreement with Qorvo to acquire the SiC JFET technology business and Qorvo's subsidiary.

Send Inquiry

Hit enter to search or ESC to close
X
We use cookies to offer you a better browsing experience, analyze site traffic and personalize content. By using this site, you agree to our use of cookies. Privacy Policy
Reject Accept