MOCVD Cover Star Disc Plate for Wafer Epitaxy

Semicorex is a renowned manufacturer and supplier of high-quality MOCVD Cover Star Disc Plate for Wafer Epitaxy. Our product is specially designed to cater to the needs of the semiconductor industry, particularly in growing the epitaxial layer on the wafer chip. Our susceptor is used as the center plate in MOCVD, with a gear or ring-shaped design. The product is highly resistant to high heat and corrosion, making it ideal for use in extreme environments.

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Product Description

Our MOCVD Cover Star Disc Plate for Wafer Epitaxy is an excellent product that ensures coating on all surface, thus avoiding peeling off. It has a high-temperature oxidation resistance that ensures stability even at high temperatures of up to 1600°C. The product is made with high purity through CVD chemical vapor deposition under high-temperature chlorination conditions. It has a dense surface with fine particles, making it highly resistant to corrosion from acid, alkali, salt, and organic reagents.
Our MOCVD Cover Star Disc Plate for Wafer Epitaxy guarantees the best laminar gas flow pattern, ensuring evenness of thermal profile. It prevents any contamination or impurities diffusion, ensuring high-quality epitaxial growth on the wafer chip. Our product is competitively priced, making it accessible to many customers. We cover many of the European and American markets, and our team is dedicated to providing excellent customer service and support. We strive to become your long-term partner in providing high-quality and reliable MOCVD Cover Star Disc Plate for Wafer Epitaxy.

Parameters of MOCVD Cover Star Disc Plate for Wafer Epitaxy

Main Specifications of CVD-SIC Coating
SiC-CVD Properties
Crystal Structure	FCC β phase
Density	g/cm ³	3.21
Hardness	Vickers hardness	2500
Grain Size	μm	2~10
Chemical Purity	%	99.99995
Heat Capacity	J·kg-1 ·K-1	640
Sublimation Temperature	℃	2700
Felexural Strength	MPa (RT 4-point)	415
Young’ s Modulus	Gpa (4pt bend, 1300℃)	430
Thermal Expansion (C.T.E)	10-6K-1	4.5
Thermal conductivity	(W/mK)	300

Features of MOCVD Cover Star Disc Plate for Wafer Epitaxy

- Avoid peeling off and ensure coating on all surface
High temperature oxidation resistance: Stable at high temperatures up to 1600°C
High purity: made by CVD chemical vapor deposition under high temperature chlorination conditions.
Corrosion resistance: high hardness, dense surface and fine particles.
Corrosion resistance: acid, alkali, salt and organic reagents.
- Achieve the best laminar gas flow pattern
- Guarantee evenness of thermal profile
- Prevent any contamination or impurities diffusion