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China semiconductor ceramic Manufacturers, Suppliers, Factory

"Sincerity, Innovation, Rigorousness, and Efficiency" may be the persistent conception of our organization for that long-term to establish jointly with customers for mutual reciprocity and mutual gain for semiconductor ceramic,semiconductor device fabrication,wafer processing,semiconductor production,wafer handling, We generally keep the philosophy of win-win, and develop long-term cooperation connection with buyers from around the planet.We feel that our expansion foundation on customer's achievement, credit rating is our daily life.
semiconductor ceramic, Our company always concentrate on the development of the international market. We've got a lot of customers in Russia , European countries, the USA, the Middle East countries and Africa countries. We always follow that quality is foundation while service is guarantee to meet all customers.

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    Semicorex TaC Coating Plate stands out as a high-performance component for demanding epitaxial growth process and further semiconductor manufacturing environments.With its series of superior properties,it can ultimately enhance the productivity and cost-effectiveness of advanced semiconductor fabrication processes.**
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    Semicorex Graphite Ion Implanter stands as a critical component in the realm of semiconductor manufacturing, distinguished by its fine particle composition, excellent conductivity, and resilience to extreme conditions.
  • Modified C/SiC Composites

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    Semicorex provide several types of modified C/SiC Composites(Ceramic Matrix Composites, CMCs), Zirconium and Hafnium, Silicon. Semicorex is committed to providing quality products at competitive prices, we look forward to becoming your long-term partner in China.
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    2" Gallium Oxide Substrates

    Semicorex 2" Gallium Oxide Substrates represent a new chapter in the story of fourth-generation semiconductors, with an accelerating pace of mass production and commercialization. These substrates exhibit exceptional benefits for various advanced technological applications. Gallium Oxide substrates not only symbolize a significant advancement in semiconductor technology but also open up new avenues for improving device efficiency and performance across a spectrum of high-stakes industries. We at Semicorex are dedicated to manufacturing and supplying high-performance 2" Gallium Oxide Substrates that fuse quality with cost-efficiency.**
  • CVD SiC Coated Graphite Shower Head

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    In a plasma apparatus for etching and chemical vapor deposition (CVD) of materials on wafers, process gases are supplied into a process chamber through a CVD SiC coated graphite shower head. Semicorex is committed to providing quality products at competitive prices, we look forward to becoming your long-term partner in China.
  • Wafer Carrier Semiconductor

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    Semicorex provides semiconductor-grade ceramics for your OEM semi fabrication tools and wafer handling components focusing on silicon carbide layers in semiconductor industries. We have been manufacturer and supplier of Wafer Carrier Semiconductor for many years. Our Wafer Carrier Semiconductor has a good price advantage and cover most of the European and American markets. We look forward to becoming your long-term partner in China.
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    The Silicon Carbide (SiC) production process encompasses the preparation of substrate and epitaxy from the materials side, followed by chip design and manufacturing, device packaging, and finally, distribution to downstream application markets. Among these stages, substrate material processing is the most challenging aspect of the SiC industry. SiC substrates are both hard and brittle, making cutting, grinding, and polishing extremely difficult. This increases the likelihood of defects during processing and reduces the yield rate. Currently, major international SiC manufacturers are planning to transition from 6-inch to 8-inch SiC wafers. Overcoming the challenges associated with 8-inch substrates has become a critical benchmark for the SiC industry. This article will introduce the key parameters of SiC substrates.

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    One of the unique properties of semiconductor materials is that their conductivity, as well as their conductivity type (N-type or P-type), can be created and controlled through a process called doping. This involves introducing specialized impurities, known as dopants, into the material to form junctions on the surface of the wafer. The industry employs two main doping techniques: thermal diffusion and ion implantation.

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