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    • China quartz tank;silicon wafer cleaning;wafer cleaning kit;wafer cleaning machine;quartz bath;fused silica glass;fused quartz price;foup cleaning;wafer container;wafer processing Manufacturers, Suppliers, Factory

    Semicorex has been producing quartz tank;silicon wafer cleaning;wafer cleaning kit;wafer cleaning machine;quartz bath;fused silica glass;fused quartz price;foup cleaning;wafer container;wafer processing for many years and is one of the professional quartz tank;silicon wafer cleaning;wafer cleaning kit;wafer cleaning machine;quartz bath;fused silica glass;fused quartz price;foup cleaning;wafer container;wafer processing manufacturers and Suppliers in China. Once you buy our advanced and durable products which supply bulk packing, we guarantee the large quantity in quick delivery. Over the years, we have provided customers with customized service. Customers are satisfied with our products and excellent service. We sincerely look forward to becoming your reliable long-term business partner! Welcome to buy products from our factory.

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    • Barrel Susceptor for Liquid Phase Epitaxy

      Barrel Susceptor for Liquid Phase Epitaxy

      If you need a graphite susceptor that can perform reliably and consistently in even the most demanding high-temperature and corrosive environments, the Semicorex Barrel Susceptor for Liquid Phase Epitaxy is the perfect choice. Its silicon carbide coating provides excellent thermal conductivity and heat distribution, ensuring exceptional performance in semiconductor manufacturing applications.
    • Silicon Carbide Wafer Chuck

      Silicon Carbide Wafer Chuck

      The Semicorex Silicon Carbide Wafer Chuck is an essential component in the semiconductor epitaxial process. It serves as a vacuum chuck to securely hold wafers during critical manufacturing stages. We are committed to delivering top-quality products at competitive prices, positioning ourselves to be your long-term partner in China.*
    • Fused Quartz Tube

      Fused Quartz Tube

      Semicorex premium Fused Quartz Tube, meticulously crafted from semiconductor-grade quartz to meet the exacting standards of modern semiconductor processing. Engineered for precision and reliability, this high-performance quartz tube is an indispensable component in the semiconductor industry. Semicorex is committed to providing quality products at competitive prices, we look forward to becoming your long-term partner in China.
    • Tantalum Carbide Crucible

      Tantalum Carbide Crucible

      Semicorex Tantalum Carbide Crucible is a crucial component in the semiconductor industry, specifically designed for the growth of Silicon Carbide (SiC) crystals. Semicorex is committed to providing quality products at competitive prices, we look forward to becoming your long-term partner in China*.
    • Graphite Thermal Field

      Graphite Thermal Field

      Semicorex Graphite Thermal Field combines cutting-edge material science with a deep understanding of crystal growth processes, it delivers innovative a solution that empowers the semiconductor industry to achieve new levels of performance, efficiency, and cost-effectiveness.**
    • Alumina Tube

      Alumina Tube

      Semicorex Alumina Tube is a pivotal component in a variety of industrial applications, renowned for its ability to withstand harsh environments and high temperatures.**
    • Related Blog
    • Reviews

    • Silicon Carbide Substrate Core Process Flow

      Silicon carbide substrate is a compound semiconductor single crystal material composed of two elements, carbon and silicon. It has the characteristics of large bandgap, high thermal conductivity, high critical breakdown field strength, and high electron saturation drift rate.

    • Silicon Carbide(SiC) Crystal Growth Furnace

      Crystal growth is the core link in the production of Silicon Carbide substrates, and the core equipment is the crystal growth furnace. Similar to traditional crystalline silicon-grade crystal growth furnaces, the furnace structure is not very complex and mainly consists of a furnace body, a heating system, a coil transmission mechanism, a vacuum acquisition and measurement system, a gas path system, a cooling system, a control system, etc., among which Thermal field and process conditions determine the quality, size, conductive properties and other key indicators of Silicon Carbide crystals.

    • What is the process of isostatic graphite manufacturing?

      The process of isostatic graphite manufacturing is Selecting raw materials, Blending, Molding, Isostatic pressing, Carbonization, Graphitization. 

    • Different types of SiC ceramics

      Silicon carbide (SiC) ceramic is a type of advanced ceramic material known for its exceptional properties and wide range of applications. It is composed of silicon (Si) and carbon (C) atoms arranged in a crystal lattice structure, resulting in a hard and strong material with excellent thermal and electrical conductivity.

    • Why Doesn’t Gllium Nitride (GaN) Epitaxy Grow on a GaN substrate?

      The growth of GaN epitaxy on GaN substrate presents a unique challenge, despite the material’s superior properties when compared to silicon. GaN epitaxy offers significant advantages in terms of band gap width, thermal conductivity, and breakdown electric field over silicon-based materials. This makes the adoption of GaN as the backbone for the third generation of semiconductors, which provide enhanced cooling, lower conduction loss, and improved performance under high temperatures and frequencies, a promising and crucial advancement for the photonic and micro-electronic industries.

    • Plasma Processes in CVD Operations

      Chemical Vapor Deposition (CVD) refers to a process technology where multiple gaseous reactants at varied partial pressures undergo a chemical reaction under specific temperature and pressure conditions. The resulting solid substance deposits on the surface of the substrate material, thereby obtaining the desired thin film. In traditional integrated circuit manufacturing processes, the obtained thin film materials are generally compounds such as oxides, nitrides, carbides, or materials like polycrystalline silicon, amorphous silicon, etc.

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