Cleaning Tank

Semicorex cleaning tank is crafted from high-quality quartz, offers unparalleled performance and reliability, ensuring that semiconductor wafers are thoroughly cleaned and free from any contaminants that could compromise their integrity.

Quartz is chosen for the construction of the cleaning tank due to its exceptional chemical resistance and thermal stability. Quartz cleaning tank resists the harsh chemicals commonly used in cleaning processes, such as hydrofluoric acid and other strong etchants. Its thermal stability ensures that it can withstand the high temperatures often required in semiconductor processing without deforming or degrading, maintaining its structural integrity and performance over long periods.

The design of the cleaning tank is meticulously engineered to optimize the cleaning process. Its smooth, seamless interior minimizes particle generation and prevents the accumulation of contaminants. The cleaning tank is designed to accommodate various cleaning methods, including chemical baths, ultrasonic cleaning, and megasonic cleaning. Each method has its specific advantages, and the versatility of the cleaning tank allows it to be used in multiple stages of the cleaning process, from initial wafer cleaning to final rinsing and drying.

In chemical baths, the cleaning tank ensures that wafers are uniformly exposed to cleaning solutions, promoting consistent and thorough cleaning. The uniform exposure is critical in removing particulate matter, organic residues, and metallic contaminants from the wafer surface. In ultrasonic and megasonic cleaning, high-frequency sound waves create microscopic cavitation bubbles in the cleaning solution. When these bubbles collapse, they generate powerful shock waves that dislodge and remove contaminants from the wafer surface. The cleaning tank's robust quartz construction can withstand the intense conditions generated by these cleaning methods, ensuring long-term durability and effectiveness.