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MOCVD Satellite Holder Plate

MOCVD Satellite Holder Plate

Semicorex MOCVD Satellite Holder Plate is an outstanding carrier designed for use in the semiconductor industry. Its high purity, excellent corrosion resistance, and even thermal profile make it an excellent choice for those looking for a carrier that can withstand the demands of the semiconductor manufacturing process. We are committed to providing our customers with high-quality products that meet their specific requirements. Contact us today to learn more about our MOCVD Satellite Holder Plate and how we can help you with your semiconductor manufacturing needs.

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Product Description

Semicorex MOCVD Satellite Holder Plate is a high-quality carrier designed for use in the semiconductor industry. Our product is coated with a high-purity silicon carbide on graphite, making it highly resistant to oxidation at high temperatures of up to 1600°C. The CVD chemical vapor deposition process used in its manufacturing ensures high purity and excellent corrosion resistance, making it ideal for use in cleanroom environments.
The features of our MOCVD Satellite Holder Plate are impressive. Its dense surface and fine particles enhance its corrosion resistance, making it resistant to acid, alkali, salt, and organic reagents. This carrier is highly stable, even in extreme environments, making it an excellent choice for those looking for a carrier that can withstand the demands of the semiconductor industry.


Parameters of MOCVD Satellite Holder Plate

Main Specifications of CVD-SIC Coating

SiC-CVD Properties

Crystal Structure

FCC β phase

Density

g/cm ³

3.21

Hardness

Vickers hardness

2500

Grain Size

μm

2~10

Chemical Purity

%

99.99995

Heat Capacity

J·kg-1 ·K-1

640

Sublimation Temperature

2700

Felexural Strength

MPa (RT 4-point)

415

Young’ s Modulus

Gpa (4pt bend, 1300℃)

430

Thermal Expansion (C.T.E)

10-6K-1

4.5

Thermal conductivity

(W/mK)

300


Features of SiC Coated Graphite Susceptor for MOCVD

- Avoid peeling off and ensure coating on all surface
High temperature oxidation resistance: Stable at high temperatures up to 1600°C
High purity: made by CVD chemical vapor deposition under high temperature chlorination conditions.
Corrosion resistance: high hardness, dense surface and fine particles.
Corrosion resistance: acid, alkali, salt and organic reagents.
- Achieve the best laminar gas flow pattern
- Guarantee evenness of thermal profile
- Prevent any contamination or impurities diffusion




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