Al2O3 Vacuum Chuck

Product Description

Applications in Semiconductor Manufacturing

Semicorex Al2O3 Vacuum Chuck is a versatile tool used across multiple stages of semiconductor production:

Thinning: During the wafer thinning process, the Al2O3 Vacuum Chuck provides stable and uniform support, ensuring high-precision substrate reduction. This is crucial for improving chip heat dissipation and enhancing device performance.

Dicing: In the dicing stage, where wafers are cut into individual chips, the Al2O3 Vacuum Chuck offers secure and stable adsorption, minimizing the risk of damage and ensuring clean cuts.

Cleaning: The smooth and uniform adsorption surface of the Al2O3 Vacuum Chuck makes it fit for wafer cleaning processes, ensuring that contaminants are effectively removed without damaging the wafers.

Transporting: During wafer handling and transportation, the Al2O3 Vacuum Chuck provides reliable and secure support, reducing the risk of damage and contamination.

Semicorex Vacuum Chuck Flow

Advantages of Semicorex Al2O3 Vacuum Chuck

1. Uniform Micro-Porous Ceramic Technology

The Al2O3 Vacuum Chuck is constructed using micro-porous ceramic technology, which involves the use of uniformly sized nano-powders. This technology ensures that the pores are evenly distributed and interconnected, resulting in high porosity and a uniformly dense structure. This uniformity enhances the vacuum chuck’ s performance, providing consistent and reliable wafer support.

2. Exceptional Material Properties

The ultra-pure 99.99% Alumina (Al2O3) used in the Al2O3 Vacuum Chuck offers a range of exceptional properties:

Thermal Properties: With high heat resistance and excellent thermal conductivity, the Al2O3 Vacuum Chuck can withstand the high temperatures commonly encountered in semiconductor manufacturing.

Mechanical Properties: The high strength and hardness of Alumina ensure that the Al2O3 Vacuum Chuck is durable and resistant to wear and tear, providing long-lasting performance.

Other Properties: Alumina also offers high electrical insulation and corrosion resistance, making the Al2O3 Vacuum Chuck suitable for a wide range of manufacturing environments.

3. Superior Flatness and Parallelism

One of the key advantages of the Al2O3 Vacuum Chuck is its high flatness and parallelism. These properties are crucial for ensuring precise and stable wafer handling, minimizing the risk of damage and ensuring consistent processing results. Additionally, the good air permeability and uniform adsorption force of the Al2O3 Vacuum Chuck ensure smooth and reliable operation.

4. Customization Options

At Semicorex, we understand that each semiconductor manufacturing process has unique requirements. That’ s why we offer customized Vacuum Chucks tailored to meet your specific needs. Depending on the required flatness and production costs, we recommend different base materials, ensuring that the weight and performance of the vacuum chuck are optimized for your application. These materials include SUS430 stainless steel, Aluminum Alloy 6061, dense Alumina ceramic (ivory color), granite, and dense silicon carbide ceramic.