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    • China TaC Coating;wafer carrier trays;Semiconductor Shower Head;semiconductor components;spare parts for epitaxial;CVD TaC;CVD coating;tantalum carbide;tantalum carbide coating;MOCVD Manufacturers, Suppliers, Factory

    Semicorex has been producing TaC Coating;wafer carrier trays;Semiconductor Shower Head;semiconductor components;spare parts for epitaxial;CVD TaC;CVD coating;tantalum carbide;tantalum carbide coating;MOCVD for many years and is one of the professional TaC Coating;wafer carrier trays;Semiconductor Shower Head;semiconductor components;spare parts for epitaxial;CVD TaC;CVD coating;tantalum carbide;tantalum carbide coating;MOCVD manufacturers and Suppliers in China. Once you buy our advanced and durable products which supply bulk packing, we guarantee the large quantity in quick delivery. Over the years, we have provided customers with customized service. Customers are satisfied with our products and excellent service. We sincerely look forward to becoming your reliable long-term business partner! Welcome to buy products from our factory.

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    • MOCVD SiC Coated Graphite Susceptor

      MOCVD SiC Coated Graphite Susceptor

      Semicorex MOCVD SiC Coated Graphite Susceptor is an advanced and specialized component used in the Metal-Organic Chemical Vapor Deposition process, a crucial technique in the production of semiconductors, optoelectronic devices, and other advanced materials. Semicorex is committed to providing quality products at competitive prices, we look forward to becoming your long-term partner in China.
    • GaN Epitaxy

      GaN Epitaxy

      Semicorex provides custom thin film HEMT (Gallium nitride) GaN epitaxy on Si/SiC/GaN substrates. Semicorex is committed to providing quality products at competitive prices, we look forward to becoming your long-term partner in China.
    • High-Temperature SiC Coating for Plasma Etch Chambers

      High-Temperature SiC Coating for Plasma Etch Chambers

      When it comes to wafer handling processes such as epitaxy and MOCVD, Semicorex's High-Temperature SiC Coating for Plasma Etch Chambers is the top choice. Our carriers provide superior heat resistance, even thermal uniformity, and durable chemical resistance thanks to our fine SiC crystal coating.
    • AlN Ceramic Disc

      AlN Ceramic Disc

      Semicorex AlN Ceramic Disc stands out as a material of exceptional capability, prized for its unique combination of thermal, mechanical, and electrical properties. At Semicorex, we are at the forefront of manufacturing AlN Ceramic Discs, ensuring that these components meet the stringent demands of modern technology and industrial applications.**
    • Wafer Loader Arm

      Wafer Loader Arm

      Semicorex Wafer Loader Arm's ability to withstand extreme conditions while maintaining exceptional performance underscores its value in optimizing manufacturing processes and achieving higher levels of productivity and quality.The integration of high-purity alumina ceramic material ensures superior cleanliness, precision, and durability.**
    • TaC Coating Epitaxial Plate

      TaC Coating Epitaxial Plate

      You can rest assured to buy TaC Coating Epitaxial Plate from our factory. Semicorex TaC (Tantalum Carbide) coating epitaxial plate boasts exceptional heat resistance, making it ideal for applications subjected to high temperatures. Its remarkable ability to withstand heat ensures durability and reliability in demanding environments. Semicorex is committed to providing quality products at competitive prices, we look forward to becoming your long-term partner in China.
    • Related Blog
    • Reviews

    • What is graphitising？

      Graphitising is the process of transforming non-graphitic charcoal into graphitic charcoal with graphite three-dimensional regular ordered structure by high-temperature heat treatment, making full use of electrical resistance heat to heat the charcoal material to 2300~3000 ℃, and transforming the charcoal with amorphous chaotic layer structure into ordered graphite crystalline structure.

    • What are SiC-coated graphite susceptors?

      The tray (base) that supports SiC wafers, also known as a "susceptor," is a core component of semiconductor manufacturing equipment. And what exactly is this susceptor that carries the wafers?

    • Oxidation Process

      The most basic stage of all processes is the oxidation process. The oxidation process is to place the silicon wafer in an atmosphere of oxidants such as oxygen or water vapor for high-temperature heat treatment (800~1200℃), and a chemical reaction occurs on the surface of the silicon wafer to form an oxide film (SiO2 film).

    • Tantalum carbide coatings in semiconductor industry

      The development of high-powered blue and UV LEDs has enabled the creation of full-color LED TV displays, as well as white LED automotive and domestic lighting. These LEDs are based on Gallium Nitride, which is deposited on substrate wafers supported by CVD SiC-coated graphite susceptor using the MOCVD process.

    • Monocrystalline silicon vs. polycrystalline silicon

      Single crystal silicon and polycrystalline silicon each have their own unique advantages and applicable scenarios. Single crystal silicon is suitable for high-performance electronic products and microelectronics due to its excellent electrical and mechanical properties. Polycrystalline silicon, on the other hand, dominates the field of solar cells due to its low cost and good photoelectric conversion efficiency.

    • Oxidation in Semiconductor Processing

      Oxidation processes play a critical role in preventing such problems by creating a protective layer on the wafer, known as the oxide layer, which acts as a barrier between different chemicals.

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