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AlN Ceramic, Due to our dedication, our products are well known throughout the world and our export volume continuously grows every year. We will continue to strive for excellence by providing high quality products that will exceed the expectation of our customers.

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  • Zirconia Ceramic Nozzle

    Zirconia Ceramic Nozzle

    Semicorex Zirconia Ceramic Nozzle, crafted with meticulous attention to detail, this nozzle stands as the epitome of excellence in controlling the flow rate of both gases and liquids with unparalleled uniformity and precision. Semicorex is committed to providing quality products at competitive prices, we look forward to becoming your long-term partner in China.
  • Al2O3 Substrate

    Al2O3 Substrate

    Semicorex proudly presents the Al2O3 Substrate, a versatile and high-performance material crafted from high-purity aluminum oxide (alumina). This advanced ceramic substrate is lauded for its exceptional properties, making it a cornerstone in various high-tech industries, including electronics, optoelectronics, and solid oxide fuel cells.**
  • SiC Ceramic Plate

    SiC Ceramic Plate

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  • Silicon Wafer Heater

    Silicon Wafer Heater

    Semicorex is a large-scale manufacturer and supplier of Silicon Carbide Coated Graphite in China. We provide heaters, support crucibles, heat shields and insulating components for single crystal growing processes and materials. We focus on semiconductor industries, our Silicon Wafer Heater has a good price advantage and cover many of the European and American markets. We look forward to becoming your long-term partner.
  • Quartz Glass Pedestal

    Quartz Glass Pedestal

    Semicorex Quartz Glass Pedestal stands as a stalwart pillar in the intricate landscape of semiconductor manufacturing. Crafted from high-purity quartz, this pedestal serves as a stable platform for the delicate dance of silicon wafers through various stages of processing. Semicorex is committed to providing quality products at competitive prices, we look forward to becoming your long-term partner in China.
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    In the process of wafer preparation, there are two core links: one is the preparation of the substrate, and the other is the implementation of the epitaxial process. The substrate, a wafer carefully made of semiconductor single crystal material, can be directly put into the wafer manufacturing process as a basis to produce semiconductor devices, or further enhance the performance through the epitaxial process.

  • Synthesizing High-Purity Silicon Carbide Powder

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  • Introducing Physical Vapor Transport (PVT) 

    SiC's own characteristics determine its single crystal growth is more difficult. Due to the absence of Si:C=1:1 liquid phase at atmospheric pressure, the more mature growth process adopted by the mainstream of the semiconductor industry can not be used to grow the more mature growth method-straight pulling method, the descending crucible method and other methods for growth. After theoretical calculations, only when the pressure is greater than 105 atm and the temperature is higher than 3200 ℃, can we get the stoichiometric ratio of Si:C = 1:1 solution. pvt method is currently one of the more mainstream methods.

  • What is a TaC coating on graphite?

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  • What is Low Temperature Plasma Etching?

    Plasma is the fourth state of matter, and it plays a crucial role in both industrial applications and natural phenomena.

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