Semicorex End Effector for Wafer Handling are dimensionally precise and thermally stable for wafer processing. We have been manufacturer and supplier of silicon carbide coating elements for many years. Our products have a good price advantage and cover most of the European and American markets. We look forward to becoming your long-term partner in China.
Semicorex End Effector for Wafer Handling are dimensionally precise and thermally stable, while having a smooth, abrasion-resistant CVD SiC coating film to safely handle wafers without damaging devices or producing particulate contamination, which can move semiconductor wafers between positions in wafer processing equipment and carriers precisely and efficiently. Our high-purity silicon carbide (SiC) coating End Effector for Wafer Handling provides superior heat resistance, even thermal uniformity for consistent epi layer thickness and resistance, and durable chemical resistance.
At Semicorex, we focus on providing high-quality, cost-effective products to our customers. Our End Effector for Wafer Handling has a price advantage and is exported to many European and American markets. We aim to be your long-term partner, delivering consistent quality products and exceptional customer service.
Parameters of End Effector for Wafer Handling
Main Specifications of CVD-SIC Coating |
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SiC-CVD Properties |
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Crystal Structure |
FCC β phase |
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Density |
g/cm ³ |
3.21 |
Hardness |
Vickers hardness |
2500 |
Grain Size |
μm |
2~10 |
Chemical Purity |
% |
99.99995 |
Heat Capacity |
J·kg-1 ·K-1 |
640 |
Sublimation Temperature |
℃ |
2700 |
Felexural Strength |
MPa (RT 4-point) |
415 |
Young’ s Modulus |
Gpa (4pt bend, 1300℃) |
430 |
Thermal Expansion (C.T.E) |
10-6K-1 |
4.5 |
Thermal conductivity |
(W/mK) |
300 |
Features of End Effector for Wafer Handling
High purity SiC coating used CVD method
Superior heat resistance & thermal uniformity
Fine SiC crystal coated for a smooth surface
High durability against chemical cleaning
Material is designed so that cracks and delamination do not occur.