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Custom SiC Cantilever Paddle

Custom SiC Cantilever Paddle

Semicorex Custom SiC Cantilever Paddle has become an indispensable component in the photovoltaic industry, playing a critical role in the efficient and precise handling of silicon wafers during high-temperature diffusion processes. The Custom SiC Cantilever Paddle, meticulously engineered from high-performance silicon carbide (SiC) ceramics, offers a unique blend of properties essential for maintaining wafer integrity, ensuring process uniformity, and maximizing productivity in demanding diffusion furnace environments.**

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Product Description

Semicorex Custom SiC Cantilever Paddle serves as the critical link between the wafer loading system and the heart of the diffusion furnace, responsible for transporting quartz or SiC wafer boats laden with silicon wafers into the high-temperature processing zone. Their design and material properties are meticulously optimized for this demanding task:


Robust Cantilever Structure for Stable Wafer Transport: The cantilevered design, characterized by a rigid arm extending into the furnace, provides exceptional stability and precise control over wafer movement. This ensures smooth and vibration-free transport, minimizing the risk of wafer breakage or misalignment during loading and unloading.


High Load Capacity for Efficient Batch Processing: The inherent strength and rigidity of SiC ceramics allow the Custom SiC Cantilever Paddle to accommodate heavy loads of silicon wafers, maximizing the throughput of each diffusion cycle and contributing to higher production volumes.


Precise Dimensional Control for Seamless Integration: The Custom SiC Cantilever Paddle is meticulously fabricated to precise dimensional specifications, ensuring a perfect fit within the diffusion furnace system and facilitating seamless integration with automated wafer handling robots.



The selection of SiC ceramics, specifically Reaction Bonded Silicon Carbide (RBSiC) and Sintered Silicon Carbide (SSiC), as the material of choice for the Custom SiC Cantilever Paddle stems from their exceptional performance characteristics in high-temperature environments:


Unwavering High-Temperature Stability: The Custom SiC Cantilever Paddle exhibits exceptional resistance to deformation and creep even at the elevated temperatures (up to 1600°C) encountered within diffusion furnaces. This ensures consistent wafer support and prevents sagging or bending that could compromise wafer uniformity.


Exceptional Thermal Shock Resistance: The ability to withstand rapid temperature transitions without damage is crucial for maintaining the Custom SiC Cantilever Paddle's integrity over countless diffusion cycles. SiC ceramics excel in this regard, minimizing the risk of cracking or fracture that could lead to costly downtime.


Low Thermal Expansion for Precise Alignment: The minimal thermal expansion of SiC ceramics ensures that the Custom SiC Cantilever Paddle maintains its dimensional stability across the wide temperature ranges experienced during operation. This is critical for maintaining precise wafer alignment within the furnace, ensuring uniform heating and consistent diffusion profiles.



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