Wafer Holder

Semicorex Wafer Holder is ingeniously engineered with a core made of high-purity graphite and meticulously coated with Silicon Carbide (SiC) to meet the demanding requirements of Liquid Phase Epitaxy (LPE) equipment. Its construction and material selection are absolutely crucial for maintaining the integrity of wafers during the high-temperature processes inherent in semiconductor fabrication.

The SiC-coated graphite Wafer Holder demonstrates outstanding resistance to wear and tear, a vital characteristic for maintaining the precise dimensions and surface quality required for optimal wafer handling. In LPE processes, the integrity of the Wafer Holder’s surface is paramount, as any degradation or unevenness could result in defects in the wafer, leading to lower yields and increased waste. The SiC coating ensures that the Wafer Holder maintains a smooth, stable surface over repeated cycles, contributing to the overall reliability and consistency of the epitaxy process.

Furthermore, the SiC coating enhances the thermal performance of the Wafer Holder. Silicon Carbide’s high thermal conductivity ensures even heat distribution across the wafer during the epitaxy process, crucial for preventing thermal gradients that could cause warping or cracking of the wafers. This guarantees that the final products meet the stringent quality standards required in semiconductor manufacturing. The combination of graphite’s inherent thermal properties with the added benefits of the SiC coating creates a Wafer Holder capable of withstanding the most challenging thermal environments.

The Wafer Holder’s design is optimized for its application in LPE equipment. The wafer holder is precisely machined to accommodate wafers securely, minimizing the risk of movement or misalignment during the epitaxy process. This precision is crucial, as even the slightest shift in wafer position can lead to uneven deposition, affecting the performance of the semiconductor devices being fabricated. The SiC-coated graphite Wafer Holder provides the necessary stability, ensuring that wafers remain in the correct position throughout the entire process.

                                                         LEP structure, from LPE