Semicorex Barrel Susceptor with SiC Coating is a cutting-edge solution designed to elevate the efficiency and precision of silicon epitaxial processes. Crafted with meticulous attention to detail, this Barrel Susceptor with SiC Coating is tailored to meet the demanding requirements of semiconductor manufacturing, serving as the optimal wafer holder and facilitating the seamless transfer of heat to wafers. Semicorex is committed to providing quality products at competitive prices, we look forward to becoming your long-term partner in China.
Constructed from high-quality isostatic graphite, renowned for its exceptional thermal conductivity and durability, our Barrel Susceptor with SiC Coating guarantees reliable performance and longevity in the most demanding environments. Furthermore, the Barrel Susceptor with SiC Coating features a specialized Silicon Carbide (SiC) coating, enhancing its thermal stability and ensuring uniform heating distribution across the wafer surface.
The barrel-shaped design of our Barrel Susceptor with SiC Coating offers unparalleled versatility, perfectly suited for integration with Applied Material and LPE units. Its innovative configuration optimizes the epitaxial growth process, promoting consistent and high-quality results with every use.
Key Features on Semicorex Barrel Susceptor with SiC Coating:
Isostatic graphite construction ensures exceptional thermal conductivity and durability.
Silicon Carbide (SiC) coating enhances thermal stability and promotes uniform heating distribution.
Barrel-shaped design provides versatility and compatibility with Applied Material and LPE units.
Customized to meet the specific requirements of silicon epitaxial processes, guaranteeing optimal performance and reliability.