Silicon Carbide ICP Etching Carrier

Looking for a reliable wafer carrier for etching processes? Look no further than Semicorex's Silicon Carbide ICP Etching Carrier. Our product is engineered to withstand high temperatures and harsh chemical cleaning, ensuring durability and longevity. With a clean and smooth surface, our carrier is perfect for handling pristine wafers.

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Product Description

Ensure optimal laminar gas flow patterns and evenness of thermal profile with Semicorex's Silicon Carbide ICP Etching Carrier. Our product is designed to achieve the best possible results for thin film deposition and wafer handling processes. With superior heat and corrosion resistance, our carrier is the perfect choice for demanding applications.

At Semicorex, we focus on providing high-quality, cost-effective products to our customers. Our Silicon Carbide ICP Etching Carrier has a price advantage and is exported to many European and American markets. We aim to be your long-term partner, delivering consistent quality products and exceptional customer service.

Parameters of Silicon Carbide ICP Etching Carrier

Main Specifications of CVD-SIC Coating
SiC-CVD Properties
Crystal Structure	FCC β phase
Density	g/cm ³	3.21
Hardness	Vickers hardness	2500
Grain Size	μm	2~10
Chemical Purity	%	99.99995
Heat Capacity	J·kg-1 ·K-1	640
Sublimation Temperature	℃	2700
Felexural Strength	MPa (RT 4-point)	415
Young’ s Modulus	Gpa (4pt bend, 1300℃)	430
Thermal Expansion (C.T.E)	10-6K-1	4.5
Thermal conductivity	(W/mK)	300