Semicorex is your partner for improving in semiconductor processing. Our silicon carbide coatings are dense, high temperature and chemical resistant, which are often used in the whole cycle of semiconductor manufacturing, including semiconductor wafer & wafer processing and semiconductor fabrication.
High-purity SiC ceramic components are crucial to processes in the semiconductor. Our offering ranges from consumables parts for wafer processing equipment, such as Silicon Carbide wafer boat, cantilever paddles, tubes, etc for Epitaxy or MOCVD.
Advantages for semiconductor processes
The thin film deposition phases such as epitaxy or MOCVD, or wafer handling processing such as etching or ion implant must endure high temperatures and harsh chemical cleaning. Semicorex supplies high-purity silicon carbide (SiC) construction provides superior heat resistance and durable chemical resistance, even thermal uniformity for consistent epi layer thickness and resistance.
Chamber Lids →
Chamber Lids used in crystal growth and wafer handling processing must endure high temperatures and harsh chemical cleaning.
Cantilever Paddle →
Cantilever Paddle is a crucial component used in semiconductor manufacturing processes, particularly in diffusion or LPCVD furnaces during processes like diffusion and RTP.
Process Tube →
Process Tube is a crucial component, specifically designed in various semiconductor processing applications such as RTP, diffusion.
Wafer Boats →
Wafer Boat is used in semiconductor processing, it has been meticulously designed to ensure the delicate wafers are kept safe during the critical stages of production.
Inlet Rings →
SiC coated gas inlet ring by MOCVD equipment Compound growth has high heat and corrosion resistance, which has great stability in extreme environment.
Focus Ring →
Semicorex supplies Silicon Carbide Coated focus ring is really stable for RTA, RTP or harsh chemical cleaning.
Wafer Chuck →
Semicorex ultra-flat ceramic vacuum wafer chucks is high purity SiC coated using in the wafer handling process.
Semicorex also have ceramic products in Alumina (Al2O3), Silicon Nitride (Si3N4), Aluminum Nitride (AIN), Zirconia (ZrO2), Composite Ceramic, etc.
Semicorex AlN Ceramic Disc stands out as a material of exceptional capability, prized for its unique combination of thermal, mechanical, and electrical properties. At Semicorex, we are at the forefront of manufacturing AlN Ceramic Discs, ensuring that these components meet the stringent demands of modern technology and industrial applications.**
Read MoreSend InquirySi3N4 Sleeve by Semicorex is a versatile and high-performance material that offers a unique combination of low density, superior hardness, excellent wear resistance, and exceptional thermal and chemical stability.**
Read MoreSend InquirySemicorex Porous Ceramic Vacuum Chuck's primary function lies in its ability to provide uniform air and water permeability, a feature that ensures the even distribution of stress and robust adhesion of silicon wafers. This characteristic is crucial during the grinding process, as it prevents the wafer from slipping, thereby maintaining the integrity of the operation.**
Read MoreSend InquirySemicorex Alumina Tube is a pivotal component in a variety of industrial applications, renowned for its ability to withstand harsh environments and high temperatures.**
Read MoreSend InquiryPBN Ceramic Disc by Semicorex is synthesized through an intricate chemical vapor deposition (CVD) process, utilizing boron trichloride (BCl3) and ammonia (NH3) at elevated temperatures and low pressures. This method of synthesis results in a material of exceptional purity and structural integrity, making it indispensable for a variety of applications within the semiconductor industry.**
Read MoreSend InquirySemicorex ZrO2 Crucible is crafted from stabilized zirconia ceramic, presenting a standard composition of 94.7% zirconium dioxide (ZrO2) and 5.2% yttrium oxide (Y2O3) by weight percentage, or alternatively, 97% ZrO2 and 3% Y2O3 by mol percentage. This precise formulation endows the ZrO2 Crucible with a suite of advantageous characteristics that cater specifically to the demands of high-performance industrial processes.**
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