SiC ICP Etching Disk

Semicorex SiC ICP Etching Disk is not merely components; it's essential enabler of cutting-edge semiconductor manufacturing as the semiconductor industry continues its relentless pursuit of miniaturization and performance, the demand for advanced materials like SiC will only intensify. It ensures the precision, reliability, and performance required to power our technology-driven world.We at Semicorex are dedicated to manufacturing and supplying high-performance SiC ICP Etching Disk that fuses quality with cost-efficiency.**

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Product Description

The adoption of Semicorex SiC ICP Etching Disk represents a strategic investment in process optimization, reliability, and ultimately, superior semiconductor device performance. The benefits are tangible:

Enhanced Etching Precision and Uniformity: The SiC ICP Etching Disk’s superior thermal and dimensional stability contribute to more uniform etching rates and precise feature control, minimizing wafer-to-wafer variation and improving device yield.

Extended Disk Lifespan: The SiC ICP Etching Disk’s exceptional hardness and resistance to wear and corrosion translate into significantly longer disk lifespans compared to conventional materials, reducing replacement costs and downtime.

Lightweight for Enhanced Performance: Despite its exceptional strength, the SiC ICP Etching Disk is a surprisingly lightweight material. This lower mass translates into reduced inertial forces during rotation, enabling faster acceleration and deceleration cycles, which improves process throughput and equipment efficiency.

Increased Throughput and Productivity: The SiC ICP Etching Disk’s lightweight nature and ability to withstand rapid thermal cycling contribute to faster processing times and increased throughput, maximizing equipment utilization and productivity.

Reduced Contamination Risk: The SiC ICP Etching Disk’s chemical inertness and resistance to plasma etching minimize the risk of particulate contamination, crucial for maintaining the purity of sensitive semiconductor processes and ensuring device quality.

CVD and Vacuum Sputtering Applications: Beyond etching, The SiC ICP Etching Disk’s exceptional properties also make it suitable for use as a substrate in Chemical Vapor Deposition (CVD) and vacuum sputtering processes, where its high-temperature stability and chemical inertness are essential.