Semicorex introduces its SiC Disc Susceptor, designed to elevate the performance of Epitaxy, Metal-Organic Chemical Vapor Deposition (MOCVD), and Rapid Thermal Processing (RTP) equipment. The meticulously engineered SiC Disc Susceptor provides with properties that guarantee superior performance, durability, and efficiency in high-temperature and vacuum environments.**
With a deep commitment to quality and innovation, Semicorex’ s ultra-pure SiC Disc Susceptor sets a new standard for performance in epitaxy, MOCVD, and RTP equipment. By combining exceptional thermal shock resistance, superior thermal conductivity, outstanding chemical resistance, and ultra-high purity, these engineered components empower semiconductor manufacturers to achieve unparalleled efficiency, reliability, and product quality. Semicorex’ s customizable solutions further ensure that each thermal processing application benefits from optimized, precision-engineered components designed to meet its unique demands.
Outstanding Thermal Shock Resistance: The SiC Disc Susceptor excels in withstanding rapid temperature fluctuations, which are common in RTP and other high-temperature processes. This exceptional thermal shock resistance ensures structural integrity and longevity, minimizing the risk of damage or failure due to sudden temperature changes and enhancing the reliability of the thermal processing equipment.
Superior Thermal Conductivity: Efficient heat transfer is critical in thermal processing applications. The excellent thermal conductivity of the SiC Disc Susceptor ensures rapid and uniform heating and cooling, essential for precise temperature control and process uniformity. This leads to improved process efficiency, reduced cycle times, and higher-quality semiconductor wafers.
Exceptional Chemical Resistance: The SiC Disc Susceptor provides outstanding resistance to a wide range of corrosive and reactive chemicals used in epitaxy, MOCVD, and RTP processes. This chemical inertness protects the underlying graphite from degradation, prevents contamination of the process environment, and ensures consistent performance over extended operational periods.
Ultra-High Purity: The SiC Disc Susceptor is manufactured to ultra-high purity standards both for graphite and SiC coating, avoiding the potential of contamination and ensuring the production of defect-free semiconductor devices. This commitment to purity means higher yields and improved device performance.
Complex Shapes Availability: The advanced manufacturing capabilities at Semicorex allow for the production of the SiC Disc Susceptor in complex shapes tailored to specific customer requirements. This flexibility enables the design of custom solutions that meet the precise needs of various thermal processing applications, enhancing process efficiency and equipment compatibility.
Usable in Oxidizing Atmospheres: The robust CVD SiC coating provides excellent protection against oxidation, allowing the SiC Disc Susceptor to perform reliably in oxidizing environments. This expands their applicability to a broader range of thermal processes, ensuring versatility and adaptability.
Sturdy, Repeatable Performance: Designed for high-temperature and vacuum environments, the SiC Disc Susceptor offers robust and repeatable performance. Its durability and consistency make them ideal for critical thermal processing applications, reducing downtime, maintenance costs, and ensuring long-term operational reliability.
Semicorex specializes in customizing CVD SiC-coated components to meet the diverse needs of thermal processing equipment, including:
Diffusers: Enhance gas distribution uniformity and process consistency.
Insulators: Provide thermal isolation and protection in high-temperature environments.
Other Custom Thermal Components: Tailored solutions designed to meet specific process requirements and optimize equipment performance.