SiC Diffusion Furnace Tube

High Flexural Strength: Semicorex SiC Diffusion Furnace Tube boasts a flexural strength exceeding 200MPa, ensuring exceptional mechanical performance and structural integrity under high stress conditions typical of semiconductor manufacturing processes.

Outstanding Oxidation Resistance: These SiC Diffusion Furnace Tubes exhibit superior oxidation resistance, the best among all non-oxide ceramics. This characteristic ensures long-term stability and performance in high-temperature environments, reducing the risk of degradation and extending the operational life of the tubes.

Excellent Corrosion Resistance: The chemical inertness of SiC Diffusion Furnace Tube provides excellent resistance to corrosion, making these tubes ideal for use in harsh chemical environments often encountered in semiconductor processing.

High Wear Resistance: the SiC Diffusion Furnace Tube is highly resistant to wear, which is crucial for maintaining dimensional stability and reducing maintenance requirements over prolonged periods of use in abrasive conditions.

Low Friction Coefficient: The low friction coefficient of the SiC Diffusion Furnace Tube reduces wear and tear on both the tubes and the wafers, ensuring smooth operation and minimizing contamination risks during semiconductor processing.

Superior High-Temperature Mechanical Properties: the SiC Diffusion Furnace Tube demonstrates the best high-temperature mechanical properties among known ceramic materials, including outstanding strength and creep resistance. This makes it particularly suitable for applications requiring long-term stability at elevated temperatures.

With CVD Coating: Semicorex Chemical Vapor Deposition (CVD) SiC coating achieves a purity level greater than 99.9995%, with impurity content below 5ppm and harmful metal impurities below 1ppm. The CVD coating process ensures the tubes meet the stringent vacuum tightness requirements of 2-3Torr, essential for high-precision semiconductor manufacturing environments.

Application in Diffusion Furnaces: These SiC Diffusion Furnace Tubes are specifically designed for use in diffusion furnaces, where they play a critical role in high-temperature processes such as doping and oxidation. Their advanced material properties ensure they can withstand the demanding conditions of these processes, thereby enhancing the efficiency and reliability of semiconductor production.