China silicon wafer polishing Manufacturers, Suppliers, Factory

"Sincerity, Innovation, Rigorousness, and Efficiency" could be the persistent conception of our organization for your long-term to establish alongside one another with shoppers for mutual reciprocity and mutual benefit for silicon wafer polishing,wafer polishing machine,silicon wafer lapping,double side polished silicon wafers,wafer holder, As a key business of this industry, our company makes endeavours to become a leading supplier, based on the faith of specialist quality & throughout the world company.
silicon wafer polishing, All the imported machines effectively control and guarantee the machining precision for the products. Besides, we have a group of high-quality management personnels and professionals, who make the high-quality products and have the ability to develop new products to expand our market home and abroad. We sincerely expect customers come for a blooming business for both of us.

Hot Products

  • ICP Plasma Etching System

    ICP Plasma Etching System

    Semicorex's SiC Coated carrier for ICP Plasma Etching System is a reliable and cost-effective solution for high-temperature wafer handling processes such as epitaxy and MOCVD. Our carriers feature a fine SiC crystal coating that provides superior heat resistance, even thermal uniformity, and durable chemical resistance.
  • SiC Coated Graphite Base Susceptors for MOCVD

    SiC Coated Graphite Base Susceptors for MOCVD

    Semicorex SiC Coated Graphite Base Susceptors for MOCVD are superior quality carriers used in the semiconductor industry. Our product is designed with high-quality silicon carbide that provide excellent performance and long-lasting durability. This carrier is ideal for use in the process of growing an epitaxial layer on the wafer chip.
  • Epi Pre Heat Ring

    Epi Pre Heat Ring

    Enhance the efficiency and precision of your semiconductor epitaxial processes with the Semicorex cutting-edge Epi Pre Heat Ring. Crafted with precision from SiC-coated graphite, this advanced ring plays a pivotal role in optimizing your epitaxial growth by pre-heating process gases before they enter the chamber.
  • Ultra-Thin Graphite with High Porosity

    Ultra-Thin Graphite with High Porosity

    Semicorex Ultra-Thin Graphite with High Porosity is primarily utilized in the semiconductor industry, particularly in the single crystal growth process featuring excellent surface adhesion, superior heat resistance, high porosity and ultra-thin thickness with outstanding machinability. We at Semicorex are dedicated to manufacturing and supplying high-performance Ultra-Thin Graphite with High Porosity that fuse quality with cost-efficiency. **
  • Rigid Graphite Felt

    Rigid Graphite Felt

    Semicorex Rigid Graphite Felt is a high-performance thermal insulation material made from PAN-based and viscose-based carbon fiber, widely used in high-temperature industrial furnaces. Choose Semicorex for its advanced manufacturing processes and proven expertise in delivering durable and reliable solutions for demanding semiconductor applications.*
  • SiC Paddles

    SiC Paddles

    Semicorex SiC Paddles are high-purity silicon carbide cantilever arm designed for wafer transport in high-temperature oxidation and diffusion furnaces above 1000℃. Choosing Semicorex means ensuring exceptional material quality, precision engineering, and long-term reliability trusted by leading semiconductor fabs.*

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