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    • China al2o3 ceramic Manufacturers, Suppliers, Factory

    Semicorex has been producing al2o3 ceramic for many years and is one of the professional al2o3 ceramic manufacturers and Suppliers in China. Once you buy our advanced and durable products which supply bulk packing, we guarantee the large quantity in quick delivery. Over the years, we have provided customers with customized service. Customers are satisfied with our products and excellent service. We sincerely look forward to becoming your reliable long-term business partner! Welcome to buy products from our factory.

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    • MOCVD SiC Coated Graphite Susceptor

      MOCVD SiC Coated Graphite Susceptor

      Semicorex MOCVD SiC Coated Graphite Susceptor is an advanced and specialized component used in the Metal-Organic Chemical Vapor Deposition process, a crucial technique in the production of semiconductors, optoelectronic devices, and other advanced materials. Semicorex is committed to providing quality products at competitive prices, we look forward to becoming your long-term partner in China.
    • Barrel Susceptor Epi System

      Barrel Susceptor Epi System

      Semicorex Barrel Susceptor Epi System is a high-quality product that offers superior coating adhesion, high purity, and high-temperature oxidation resistance. Its even thermal profile, laminar gas flow pattern, and prevention of contamination make it an ideal choice for the growth of epixial layers on wafer chips. Its cost-effectiveness and customizability make it a highly competitive product in the market.
    • SiC Coated Graphite Lid Cover

      SiC Coated Graphite Lid Cover

      Unlock the epitome of performance and durability in the realm of semiconductor equipment with our cutting-edge SiC Coated Graphite Lid Cover. This disc-shaped component is expertly designed for various semiconductor applications, offering a unique combination of graphite and Silicon Carbide (SiC) coating to enhance functionality and efficiency. Semicorex is committed to providing quality products at competitive prices, we look forward to becoming your long-term partner in China.
    • Graphite Soft Felt

      Graphite Soft Felt

      Semicorex Graphite Soft Felt is a high-performance insulation material designed to maintain optimal temperature conditions in semiconductor crystal growth processes. Semicorex offers advanced solutions with superior thermal management, ensuring high-quality materials and reliable performance in critical semiconductor manufacturing applications.*
    • Alumina Ceramic Vacuum Chuck

      Alumina Ceramic Vacuum Chuck

      Semicorex Alumina Ceramic Vacuum Chuck is applied in the wafer thinning and grinding processes of semiconductor manufacturing, serving as an indispensable tool for achieving high-precision and reliable semiconductor production.**
    • SiC MOCVD Inner Segment

      SiC MOCVD Inner Segment

      Semicorex SiC MOCVD Inner Segment is an essential consumable for metal-organic chemical vapor deposition (MOCVD) systems used in the production of silicon carbide (SiC) epitaxial wafers. It's precisely designed to withstand the demanding conditions of SiC epitaxy, ensuring optimal process performance and high-quality SiC epilayers.**
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    • What is the process of isostatic graphite manufacturing?

      The process of isostatic graphite manufacturing is Selecting raw materials, Blending, Molding, Isostatic pressing, Carbonization, Graphitization. 

    • GaN Industry Applications

      The application areas of SiC-based and Si-based GaN are not strictly separated. In GaN-On-SiC devices, the cost of SiC substrate is relatively high, and with the growing maturity of SiC long crystal technology, the cost of the device is expected to fall further, and it is used in power devices in the field of power electronics.

    • Introducing Silicon Material

      Silicon is the second most abundant element on Earth after oxygen. Most silicon is found in soil, rocks, natural water, trees, and plants.

    • Understanding Chemical Vapor Deposition (CVD): A Comprehensive Overview

      Chemical Vapor Deposition (CVD) is a versatile thin-film deposition technique widely employed in the semiconductor industry for fabricating high-quality, conformal thin films on various substrates. This process involves chemical reactions of gaseous precursors onto a heated substrate surface, resulting in the formation of a solid thin film. This article delves into the intricacies of CVD, exploring its mechanisms, advantages, limitations, and key applications in semiconductor manufacturing.

    • Why choose liquid phase epitaxy method?

      Compared with the PVT method, the liquid phase method for growing SiC has the following advantages:

    • What is Thermal Annealing

      The annealing process, also known as Thermal Annealing, is a crucial step in semiconductor manufacturing.

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