Products

Semicorex is a professional manufacturers and suppliers in China. Our factory provides barrel susceptor, mocvd susceptor, wafer boat, etc. Extreme design, quality raw materials, high performance and competitive price are what every customer wants, and that's also what we can offer you. We take high quality, reasonable price and perfect service.
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SiC Coated PSS Etching Carrier

SiC Coated PSS Etching Carrier

Wafer carriers used in epixial growth and wafer handling processing must endure high temperatures and harsh chemical cleaning. Semicorex SiC Coated PSS Etching Carrier engineered specifically for these demanding epitaxy equipment applications. Our products have a good price advantage and cover many of the European and American markets. We look forward to becoming your long-term partner in China.

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SiC Coated Barrel Susceptor for LPE Epitaxial Growth

SiC Coated Barrel Susceptor for LPE Epitaxial Growth

Semicorex SiC Coated Barrel Susceptor for LPE Epitaxial Growth is a high-performance product designed to provide consistent and reliable performance over an extended period. Its even thermal profile, laminar gas flow pattern, and prevention of contamination make it an ideal choice for the growth of high-quality epitaxial layers on wafer chips. Its customizability and cost-effectiveness make it a highly competitive product in the market.

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Barrel Susceptor Epi System

Barrel Susceptor Epi System

Semicorex Barrel Susceptor Epi System is a high-quality product that offers superior coating adhesion, high purity, and high-temperature oxidation resistance. Its even thermal profile, laminar gas flow pattern, and prevention of contamination make it an ideal choice for the growth of epixial layers on wafer chips. Its cost-effectiveness and customizability make it a highly competitive product in the market.

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Liquid Phase Epitaxy (LPE) Reactor System

Liquid Phase Epitaxy (LPE) Reactor System

Semicorex Liquid Phase Epitaxy (LPE) Reactor System is an innovative product that offers excellent thermal performance, even thermal profile, and superior coating adhesion. Its high purity, high-temperature oxidation resistance, and corrosion resistance make it an ideal choice for use in the semiconductor industry. Its customizable options and cost-effectiveness make it a highly competitive product in the market.

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CVD Epitaxial Deposition In Barrel Reactor

CVD Epitaxial Deposition In Barrel Reactor

Semicorex CVD Epitaxial Deposition In Barrel Reactor is a highly durable and reliable product for growing epixial layers on wafer chips. Its high-temperature oxidation resistance and high purity make it suitable for use in the semiconductor industry. Its even thermal profile, laminar gas flow pattern, and prevention of contamination make it an ideal choice for high-quality epixial layer growth.

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Silicon Epitaxial Deposition In Barrel Reactor

Silicon Epitaxial Deposition In Barrel Reactor

If you need a high-performance graphite susceptor for use in semiconductor manufacturing applications, the Semicorex Silicon Epitaxial Deposition In Barrel Reactor is the ideal choice. Its high-purity SiC coating and exceptional thermal conductivity provide superior protection and heat distribution properties, making it the go-to choice for reliable and consistent performance in even the most challenging environments.

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