Process Tube for Diffusion Furnaces

Semicorex process tube for diffusion furnaces is typically made of high-purity SiC with CVD SiC coating. These materials are chosen for their excellent thermal stability and resistance to corrosive gases and high temperatures.

Semicorex process tube for diffusion furnaces is cylindrical in shape, with a closed end and an open end. It is inserted into the diffusion furnace, forming a sealed chamber where the diffusion process takes place. The tube is carefully designed to prevent any leakage of gases and maintain a controlled atmosphere within the furnace.

a process tube for diffusion furnaces plays a crucial role in the fabrication of semiconductor devices. It provides a controlled environment for diffusion processes, ensuring uniform doping profiles and precise control over process parameters. The use of high-purity materials and careful design considerations help maintain the integrity of the process tube and ensure the production of high-quality semiconductor wafers.