Wafer Carrier for MOCVD

The Semicorex Wafer Carrier for MOCVD’s advanced design for MOCVD applications acts as a secure foundation, expertly engineered to cradle semiconductor wafers. It offers an optimized design that ensures a tight grip on the wafers alongside facilitating an optimal distribution of gases for uniform material layering. Enhanced with a Silicon Carbide (SiC) coating through Chemical Vapor Deposition (CVD), the Wafer Carrier for MOCVD combines the resilience of graphite with the CVD SiC’s attributes of enduring high temperatures, possessing a negligible thermal expansion coefficient, and promoting equalized heat dispersion. This equilibrium is crucial in preserving the integrity of the wafers’ surface temperature.

Boasting attributes such as corrosion inhibition, chemical resilience, and consequently an extended operational lifespan, the Wafer Carrier for MOCVD significantly uplifts both the caliber and yield of the wafers. Its durability presents a direct economic benefit, positioning the Wafer Carrier for MOCVD as a wise procurement choice for your semiconductor production operations.

Meticulously tailored for the epitaxial procedures of wafers, the Semicorex Wafer Carrier for MOCVD excels in the secure transportation of wafers within high-temperature furnaces. Its durable framework ensures the wafers stay intact, thereby reducing the propensity for damage during the critical epitaxial growth stages.**