Tantalum Carbide Coating Halfmoon Part

The Semicorex Tantalum Carbide Coating Halfmoon Part is a highly specialized component intended for application in the epitaxial deposition process. This Tantalum Carbide-coated Halfmoon Part is pivotal in environments where resistance to high temperatures, exceptional durability, and unparalleled chemical inertness are imperative.

Tantalum Carbide Coating Halfmoon Part is constructed from high-purity tantalum carbide, offering excellent thermal conductivity and extreme resistance to high temperatures and thermal shock. The TaC coating provides an additional layer of protection against corrosive chemicals and harsh environments typical in epitaxial reactors. The coating enhances the durability and lifespan of the part, ensuring consistent performance over multiple cycles.

Tantalum Carbide Coating Halfmoon Part is capable of withstanding temperatures up to 2200°C, making it ideal for high-temperature processes. Exhibits low reactivity with silicon and other semiconductor materials, maintaining the integrity of the epitaxial layers.

Tantalum Carbide Coating Halfmoon Part primarily used in the semiconductor industry, specifically in the epitaxial growth of silicon carbide. Suitable for use in both research and industrial-scale epitaxial reactors.