TaC Coated Crucible

Introducing the CVD Tac coated crucible, the perfect solution for semiconductor equipment manufacturers and users who demand the highest level of quality and performance. Our crucibles are coated with a state-of-the-art CVD Tac (tantalum carbide) layer, which provides superior resistance to corrosion and wear, making them ideal for use in a variety of semiconductor applications.

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Product Description

Crafted from high-quality materials and coated with the most advanced CVD Tac technology, our crucibles offer exceptional performance and longevity. The CVD Tac coating provides a highly uniform, dense layer that is highly resistant to chemical attack, abrasion, and thermal shock. This ensures that our crucibles maintain their shape and dimensions even after repeated use, reducing the need for frequent replacements.

Our CVD Tac coated crucibles are also highly compatible with a wide range of semiconductor processes, including chemical vapor deposition (CVD), physical vapor deposition (PVD), and atomic layer deposition (ALD). Whether you are producing microchips, solar cells, or other semiconductor devices, our crucibles can help you achieve optimal results.

Parameters of TaC Coating

Projects	Parameters
Density	14.3 (gm/cm³)
Emissivity	0.3
CTE (×10^-6/K)	6.3
Hardness (HK)	2000
Resistance (Ohm-cm)	1×10^-5
Thermal Stability	<2500℃
Graphite Dimension Change	-10~-20um (reference value)
Coating Thickness	≥20um typical value(35um±10um)

The above are typical values