Solid Silicon Carbide Focusing Ring

The Semicorex Solid Silicon Carbide Focusing Ring is a pivotal component in semiconductor manufacturing, strategically positioned outside the wafer to maintain direct contact. By utilizing an applied voltage, this ring focuses the plasma traversing it, thereby enhancing the process uniformity on the wafer. Constructed solely from Chemical Vapor Deposition Silicon Carbide (CVD SiC), this focus ring embodies the exceptional qualities demanded by the semiconductor industry. We at Semicorex are dedicated to manufacturing and supplying high-performance Solid Silicon Carbide Focusing Ring that fuse quality with cost-efficiency.

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Product Description

In semiconductor fabrication, the Semicorex Solid Silicon Carbide Focusing Ring serves a crucial role by acting as a shield, preserving the wafer’s integrity during the etching process. Its meticulously engineered design ensures precise and uniform etching, thereby facilitating the production of highly intricate semiconductor elements that exhibit superior performance and reliability.

Silicon carbide is the material of choice for the focusing ring due to its superior resistance to plasma corrosion when exposed to plasma within the vacuum reaction chamber. The Solid Silicon Carbide Focusing Ring outperform traditional silicon in several aspects, including:

(1) High density that minimizes etching rates.

(2) Superior band gap and excellent insulation properties.

(3) Exceptional thermal conductivity, low thermal expansion coefficient, and thermal shock resistance.

(4) High elasticity coupled with excellent resistance to mechanical impacts.

(5) Outstanding hardness, wear resistance, and corrosion resistance.

Silicon carbide’ s conductivity and resistance to ion etching are akin to silicon, making the Solid Silicon Carbide Focusing Ring an ideal material for this application.

The Semicorex Solid Silicon Carbide Focusing Ring stands as a state-of-the-art solution in the realm of semiconductor manufacturing. It leverages the unique properties of CVD SiC to facilitate reliable, high-performance etching processes, significantly contributing to the advancement of semiconductor technology.