SiC Shower Head

Semicorex SiC Shower Head is an essential component in the epitaxial growth process, specifically designed to enhance the uniformity and efficiency of thin film deposition on semiconductor wafers. SiC Shower Head is fabricated from bulk Silicon Carbide (SiC). Known for its exceptional thermal conductivity, mechanical strength, and chemical resistance, this SiC Shower Head ensures optimal performance in high-temperature and corrosive environments typical of epitaxial reactors.

The showerhead shape of the SiC Shower Head is meticulously engineered to facilitate the even distribution of precursor gases over the wafer surface. Its array of precision-drilled holes allows for a controlled and consistent flow, which is crucial for achieving high-quality epitaxial layers with uniform thickness and composition. This design minimizes gas phase reactions and particle generation, contributing to superior wafer yields and device performance.

Ideal for use in both research and high-volume production settings, the SiC Shower Head stands out due to its durability and reliability, significantly reducing maintenance downtime and operational costs. Its compatibility with various epitaxial processes, including Chemical Vapor Deposition (CVD), makes it a versatile and invaluable asset in the semiconductor manufacturing industry.