Pancake Susceptor for Wafer Epitaxial Process

Semicorex pancake susceptor for wafer epitaxial process is a high purity graphite base by CVD SiC coated. Our pancake susceptor for wafer epitaxial process has a good price advantage and cover most of the European and American markets. We look forward to becoming your long-term partner in China.

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Product Description

Wafer epitaxy is a technique used to grow high-quality crystalline films on a semiconductor substrate. It involves placing the substrate inside a reactor chamber and exposing it to a controlled environment where the desired material is deposited layer by layer.

Pancake susceptor for wafer epitaxial process is a round shape of the graphite susceptor, which is used in various semiconductor processes, such as chemical vapor deposition (CVD) or physical vapor deposition (PVD), to enhance temperature uniformity and promote film growth.