MOCVD Susceptors

The Semicorex MOCVD Susceptors are purpose-built to endure the high-temperature landscapes and resist the harsh chemical regimes often employed in wafer production processes. Through precision engineering, these components are tailored to meet the stringent requirements of epitaxial reactor systems. The composition of our MOCVD Susceptors, featuring silicon carbide (SiC) coated on premium graphite, not only delivers robustness in extreme thermal and corrosive conditions but also guarantees an even distribution of heat, vital for maintaining consistent quality in epitaxial film deposition.

In addition, the impressive thermal properties of our MOCVD Susceptors allow for swift and even temperature management during semiconductor growth, optimizing the production process. Their resistance to high temperatures, oxidation, and corrosion ensures dependable function even in the most challenging operational settings.

Moreover, the MOCVD Susceptors are designed with an emphasis on uniformity, which is critical for the synthesis of single-crystal substrates. The level of planarity achieved is indispensable for achieving superior single-crystal growth on the wafer surface.

At Semicorex, our passion for surpassing the industry benchmarks is rivaled only by our commitment to cost-efficiency for our partners. We strive to provide products like the MOCVD Susceptors that not only fulfill but anticipate the evolving needs of semiconductor fabrication, ensuring your operations are equipped with the finest tools available.