High-purity Graphite Powder

Semicorex High-purity graphite powder is a critical material in the semiconductor industry. With exceptional purity levels and superior physical and chemical properties, this material is indispensable for applications requiring stringent performance standards.

Key Features

• Exceptional Purity: High-purity graphite powder typically achieves carbon content exceeding 99.9%, ensuring minimal contamination during the crystal growth process. This level of purity is essential to maintain the integrity and quality of semiconductor wafers.
• Excellent Thermal Conductivity: The material’s superior thermal conductivity enables uniform heat distribution, critical in maintaining controlled growth environments for semiconductor crystals.
• High Temperature Resistance: High-purity graphite powder can withstand extreme temperatures without degradation, making it ideal for high-temperature furnaces used in semiconductor manufacturing.
• Chemical Stability: Its resistance to chemical reactions ensures durability and reliability during prolonged exposure to harsh conditions, including high temperatures and reactive environments.
• Customizable Particle Size: Available in various particle sizes, the powder can be tailored to meet the specific needs of different semiconductor crystal growth processes.

Applications in Semiconductor Crystal Growth

1. SiC Crystal Growth:

High-purity graphite powder is extensively used in silicon carbide (SiC) crystal growth, a process crucial for producing advanced semiconductor devices. The powder is utilized in the production of porous graphite components, such as crucibles and insulation materials, that support the growth of high-quality SiC crystals. Its high purity minimizes impurities, thereby enhancing the electrical and thermal properties of the resulting crystals.

2. Photovoltaic Silicon Crystal Growth:

In the photovoltaic industry, high-purity graphite powder is employed in the production of components for single-crystal and polycrystalline silicon growth. These components, such as molds and heaters, ensure consistent quality and yield in the fabrication of silicon wafers for solar cells.

3. Epitaxial Layer Deposition:

The material is also integral to epitaxy processes, where precise thermal and chemical conditions are required to grow layers of semiconductor material. High-purity graphite powder contributes to the manufacture of epitaxy components, such as susceptors, which demand exceptional thermal and chemical performance.

4. Graphite-Based Thermal Insulation:

In high-temperature furnaces used for crystal growth, graphite powder is utilized to create insulation materials that maintain stable thermal environments. This enhances process efficiency and ensures the uniformity of grown crystals.

Semicorex’s high-purity graphite powder stands out due to its unparalleled quality and application-driven design. Our stringent production processes ensure consistency, high purity, and tailored specifications to meet the exacting requirements of the semiconductor industry.

Semicorex High-purity graphite powder is a cornerstone material in semiconductor crystal growth, offering unmatched performance in demanding applications. Its exceptional thermal, chemical, and structural properties ensure the successful production of advanced semiconductor devices. With its commitment to innovation and quality, Semicorex provides a trusted solution for manufacturers aiming to achieve excellence in semiconductor processes.