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China Silicon Carbide Coated Manufacturers, Suppliers, Factory

SiC coating is a thin layer onto the susceptor through the chemical vapor deposition(CVD) process. Silicon carbide material provides a number of advantages over silicon, including 10x the breakdown electric field strength, 3x the band gap, which provides the material with high temperature and chemical resistance, excellent wear resistance as well as thermal conductivity.

Semicorex provides customized service, help you innovate with components that last longer, reduce cycle times, and improve yields.


SiC coating possesses several unique advantages

High Temperature Resistance: CVD SiC coated susceptor can withstand high temperatures up to 1600°C without undergoing significant thermal degradation.

Chemical Resistance: The silicon carbide coating provides excellent resistance to a wide range of chemicals, including acids, alkalis, and organic solvents.

Wear Resistance: The SiC coating provides the material with excellent wear resistance, making it suitable for applications that involve high wear and tear.

Thermal Conductivity: The CVD SiC coating provides the material with high thermal conductivity, making it suitable for use in high-temperature applications that require efficient heat transfer.

High Strength and Stiffness: The silicon carbide coated susceptor provides the material with high strength and stiffness, making it suitable for applications that require high mechanical strength.


SiC coating is used in various applications

LED Manufacturing: CVD SiC coated susceptor is used in manufacturing processed of various LED types, including blue and green LED, UV LED and deep-UV LED, due to its high thermal conductivity and chemical resistance.



Mobile communication: CVD SiC coated susceptor is a crucial part of the HEMT to complete the GaN-on-SiC epitaxial process.



Semiconductor Processing: CVD SiC coated susceptor is used in the semiconductor industry for various applications, including wafer processing and epitaxial growth.





SiC coated graphite components

Made by Silicon Carbide Coating (SiC) graphite, the coating is applied by a CVD method to specific grades of high density graphite, so it can operate in the high temperature furnace with over 3000 °C in an inert atmosphere, 2200°C in vacuum.

The special properties and low mass of the material allow fast heating rates, uniform temperature distribution and outstanding precision in control.


Material data of Semicorex SiC Coating

Typical properties

Units

Values

Structure


FCC β phase

Orientation

Fraction (%)

111 preferred

Bulk density

g/cm³

3.21

Hardness

Vickers hardness

2500

Heat Capacity

J·kg-1 ·K-1

640

Thermal expansion 100–600 °C (212–1112 °F)

10-6K-1

4.5

Young’ s Modulus

Gpa (4pt bend, 1300℃)

430

Grain Size

μm

2~10

Sublimation Temperature

2700

Felexural Strength

MPa (RT 4-point)

415

Thermal conductivity

(W/mK)

300


Conclusion CVD SiC coated susceptor is a composite material that combines the properties of a susceptor and silicon carbide. This material possesses unique properties, including high temperature and chemical resistance, excellent wear resistance, high thermal conductivity, and high strength and stiffness. These properties make it an attractive material for various high-temperature applications, including semiconductor processing, chemical processing, heat treatment, solar cell manufacturing, and LED manufacturing.






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SiC Plate for ICP Etching Process

SiC Plate for ICP Etching Process

Semicorex's SiC Plate for ICP Etching Process is the perfect solution for high-temperature and harsh chemical processing requirements in thin film deposition and wafer handling. Our product boasts superior heat resistance and even thermal uniformity, ensuring consistent epi layer thickness and resistance. With a clean and smooth surface, our high-purity SiC crystal coating provides optimal handling for pristine wafers.

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SiC Coated ICP Etching Carrier

SiC Coated ICP Etching Carrier

Semicorex SiC Coated ICP Etching Carrier engineered specifically for epitaxy equipment with high heat and corrosion resistance in China. Our products have a good price advantage and cover many of the European and American markets. We look forward to becoming your long-term partner in China.

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Etching Carrier Holder for PSS Etching

Etching Carrier Holder for PSS Etching

Semicorex's Etching Carrier Holder for PSS Etching is engineered for the most demanding epitaxy equipment applications. Our ultra-pure graphite carrier can withstand harsh environments, high temperatures, and harsh chemical cleaning. The SiC coated carrier has excellent heat distribution properties, high thermal conductivity, and is cost-effective. Our products are widely used in many European and American markets, and we look forward to becoming your long-term partner in China.

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PSS Handling Carrier for Wafer Transfer

PSS Handling Carrier for Wafer Transfer

Semicorex's PSS Handling Carrier for Wafer Transfer is engineered for the most demanding epitaxy equipment applications. Our ultra-pure graphite carrier can withstand harsh environments, high temperatures, and harsh chemical cleaning. The SiC coated carrier has excellent heat distribution properties, high thermal conductivity, and is cost-effective. Our products are widely used in many European and American markets, and we look forward to becoming your long-term partner in China.

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Silicon Etch Plate for PSS Etching Applications

Silicon Etch Plate for PSS Etching Applications

Semicorex's Silicon Etch Plate for PSS Etching Applications is a high-quality, ultra-pure graphite carrier that is specifically designed for epitaxial growth and wafer handling processes. Our carrier can withstand harsh environments, high temperatures, and harsh chemical cleaning. The silicon etch plate for PSS etching applications has excellent heat distribution properties, high thermal conductivity, and is cost-effective. Our products are widely used in many European and American markets, and we look forward to becoming your long-term partner in China.

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PSS Etching Carrier Tray for Wafer Processing

PSS Etching Carrier Tray for Wafer Processing

Semicorex's PSS Etching Carrier Tray for Wafer Processing is specifically designed for the demanding epitaxy equipment applications. Our ultra-pure graphite carrier is ideal for thin-film deposition phases like MOCVD, epitaxy susceptors, pancake or satellite platforms, and wafer handling processing such as etching. The PSS Etching Carrier Tray for Wafer Processing has high heat and corrosion resistance, excellent heat distribution properties, and a high thermal conductivity. Our products are cost-effective and have a good price advantage. We cater to many European and American markets and look forward to becoming your long-term partner in China.

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Semicorex has been producing Silicon Carbide Coated for many years and is one of the professional Silicon Carbide Coated manufacturers and Suppliers in China. Once you buy our advanced and durable products which supply bulk packing, we guarantee the large quantity in quick delivery. Over the years, we have provided customers with customized service. Customers are satisfied with our products and excellent service. We sincerely look forward to becoming your reliable long-term business partner! Welcome to buy products from our factory.
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