Chemical Vapor Deposition Coating Machine for Uniform Film Deposition

With its excellent density and thermal conductivity, the Semicorex Durable SiC-Coated Barrel Susceptor is the ideal choice for use in epitaxial processes and other semiconductor manufacturing applications. Its high-purity SiC coating provides superior protection and heat distribution properties, making it the go-to choice for reliable and consistent results.

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Product Description

Our firm insists all along the quality policy of "product high quality is base of organization survival; consumer fulfillment could be the staring point and ending of an company; persistent improvement is eternal pursuit of staff" along with the consistent purpose of "reputation 1st, purchaser first" for Chemical Vapor Deposition Coating Machine for Uniform Film Deposition, With us your money in risk-free your company in safe and sound . Hope we are able to be your trustworthy supplier in China . Seeking forward for your cooperation . Chemical Vapor Deposition Coating Machine for Uniform Film Deposition Chemical Vapor Deposition Furnace, Chemical Vapor Deposition, CVD, In order to meet our market demands, we now have paied more attention to the quality of our products and solutions and services. Now we can meet customers' special requirements for special designs. We persistently develop our enterprise spirit "quality lives the enterprise, credit assures cooperation and keep the motto in our minds: customers first.

If you need a high-quality graphite susceptor with superior heat and corrosion resistance, look no further than the Semicorex Chemical Vapor Deposition Coating Machine for Uniform Film Deposition. Its silicon carbide coating provides exceptional thermal conductivity and heat distribution, ensuring reliable and consistent performance in even the most demanding high-temperature environments.
Our Chemical Vapor Deposition Coating Machine for Uniform Film Deposition is designed to achieve the best laminar gas flow pattern, ensuring evenness of thermal profile. This helps to prevent any contamination or impurities diffusion, ensuring high-quality epitaxial growth on the wafer chip.
Contact us today to learn more about our Chemical Vapor Deposition Coating Machine for Uniform Film Deposition.

Parameters of Chemical Vapor Deposition Coating Machine for Uniform Film Deposition

Main Specifications of CVD-SIC Coating
SiC-CVD Properties
Crystal Structure	FCC β phase
Density	g/cm ³	3.21
Hardness	Vickers hardness	2500
Grain Size	μm	2~10
Chemical Purity	%	99.99995
Heat Capacity	J·kg-1 ·K-1	640
Sublimation Temperature	℃	2700
Felexural Strength	MPa (RT 4-point)	415
Young’ s Modulus	Gpa (4pt bend, 1300℃)	430
Thermal Expansion (C.T.E)	10-6K-1	4.5
Thermal conductivity	(W/mK)	300

Features of Chemical Vapor Deposition Coating Machine for Uniform Film Deposition

- Both the graphite substrate and silicon carbide layer have good density and can play a good protective role in high temperature and corrosive working environments.

- Silicon carbide coated susceptor used for single crystal growth has a very high surface flatness.

- Reduce the difference in thermal expansion coefficient between the graphite substrate and silicon carbide layer, effectively improve the bonding strength to prevent cracking and delamination.

- Both the graphite substrate and silicon carbide layer have a high thermal conductivity, and excellent heat distribution properties.

- High melting point, high temperature oxidation resistance, corrosion resistance.

Hot Tags: Chemical Vapor Deposition Furnace, Chemical Vapor Deposition, CVD

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