Semicorex CVD SiC Coated Graphite Susceptor, is a specialized tool used in the handling and processing of semiconductor wafers. The susceptor plays a crucial role in facilitating the growth of thin films, epitaxial layers, and other coatings on substrates with precise control over temperature and material properties. Semicorex is committed to providing quality products at competitive prices, we look forward to becoming your long-term partner in China.
The CVD SiC Sic Ceramic Substrate /Plates is a meticulously engineered component designed to create an optimal thermal environment for the controlled deposition of thin films and coatings onto semiconductor wafers or other substrate materials. It is a critical element within a CVD reactor, serving as both a heat source and a platform for holding and positioning the substrates during the deposition process.
Advantages:
Precise Deposition: The CVD SiC Sic Ceramic Substrate /Plates enables controlled and precise deposition of thin films and coatings, leading to high-quality and reproducible results.
Reduced Contamination: The SiC coating minimizes the risk of contamination from the susceptor itself, ensuring the purity of the deposited materials.
Longevity and Durability: The SiC coating enhances the susceptor's resistance to oxidation and chemical reactions, contributing to its longevity and reliability over extended use.