Fused Quartz Pedestal

In semiconductor fabrication, the Fused Quartz Pedestal serves as a support structure for the quartz boat, which holds the wafers. By maintaining a constant temperature, it helps achieve uniform thin-film deposition, a critical factor for the performance and reliability of semiconductor devices. The pedestal ensures that thermal and light distribution within the process chamber is even, thereby enhancing the overall quality of the deposition process.

Advantages of Fused Quartz Material

1.High Temperature Resistance

The Fused Quartz Pedestal boasts a softening point of approximately 1730°C, allowing it to withstand prolonged use at temperatures ranging from 1100°C to 1250°C. Moreover, it can endure short-term exposure to temperatures as high as 1450°C.

2.Corrosion Resistance

The Fused Quartz Pedestal is chemically inert to most acids, with the exception of hydrofluoric acid. Its acid resistance surpasses that of ceramics by 30 times and stainless steel by 150 times. At elevated temperatures, no other material can match the chemical stability of fused quartz, making it an ideal choice for harsh chemical environments.

3. Thermal Stability

One of the standout features of the Fused Quartz Pedestal is its minimal thermal expansion coefficient. This property allows it to withstand severe temperature shifts without cracking. For instance, it can be rapidly heated to 1100°C and then immersed in water at room temperature without sustaining damage—an essential characteristic for high-stress manufacturing processes.

Manufacturing Process

The manufacturing process for the Fused Quartz Pedestal is meticulously controlled to ensure the highest quality standards. The pedestals are produced through thermoforming and welding processes conducted in cleanroom environments of class 10,000 or higher. Subsequent cleaning with ultrapure water (18 MΩ) further ensures the purity and performance of the product. Every Fused Quartz Pedestal undergoes rigorous inspection, cleaning, and packaging in a class 1,000 or higher cleanroom to meet the stringent requirements of semiconductor fabrication.

High Purity Opaque Quartz Material

To effectively block heat and light, the Fused Quartz Pedestal utilizes high-purity opaque quartz material. This material’s unique properties enhance the pedestal’s ability to maintain a stable and uniform temperature within the process chamber, thereby ensuring the consistent quality of thin-film deposition on wafers.

Wide Range of Applications

The exceptional properties of the Fused Quartz Pedestal make it suitable for a variety of applications within the semiconductor industry. In ALD processes, it supports the precise control of thin film growth at the atomic level, essential for the production of advanced semiconductor devices. During LPCVD processes, the pedestal’s thermal stability and light-blocking capabilities contribute to uniform film deposition, improving device performance and yield.

In diffusion processes, the Fused Quartz Pedestal’s high-temperature resistance and chemical inertness ensure reliable and consistent doping of semiconductor materials. These processes are critical for defining the electrical properties of semiconductor devices, and the use of high-quality materials like fused quartz is essential for achieving optimal results.