What is CVD for SiC

Chemical vapor deposition, or CVD, is a commonly used method of creating thin films used in semiconductor manufacturing. In the context of SiC, CVD refers to the process of growing SiC thin films or coatings by the chemical reaction of gaseous precursors on a substrate. The general steps involved in SiC CVD are as follows:

Substrate preparation: The substrate, usually a silicon wafer, is cleaned and prepared to ensure a clean surface for the SiC deposition.

Precursor gas preparation: Gaseous precursors containing silicon and carbon atoms are prepared. Common precursors include silane (SiH4) and methylsilane (CH3SiH3).

Reactor setup: The substrate is placed inside a reactor chamber, and the chamber is evacuated and purged with an inert gas, such as argon, to remove impurities and oxygen.

Deposition process: The precursor gases are introduced into the reactor chamber, where they undergo chemical reactions to form SiC on the substrate surface. The reactions are typically carried out at high temperatures (800-1200 degrees Celsius) and under controlled pressure.

Film growth: The SiC film gradually grows on the substrate as the precursor gases react and deposit SiC atoms. The growth rate and film properties can be influenced by various process parameters, such as temperature, precursor concentration, gas flow rates, and pressure.

Cooling and post-treatment: Once the desired film thickness is achieved, the reactor is cooled down, and the SiC-coated substrate is removed. Additional post-treatment steps, such as annealing or surface polishing, may be performed to enhance the film's properties or remove any defects.

SiC CVD allows precise control over film thickness, composition, and properties. It is widely used in the semiconductor industry for the production of SiC-based electronic devices, such as high-power transistors, diodes, and sensors. The CVD process enables the deposition of uniform and high-quality SiC films with excellent electrical conductivity and thermal stability, making it suitable for various applications in power electronics, aerospace, automotive, and other industries.

Semicorex major in CVD SiC coated products with wafer holder/susceptor, SiC parts, etc.