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High-Purity Quartz: An Indispensable Material for the Semiconductor Industry

2024-08-12

High-purity quartz possesses remarkable physical and chemical properties. Its inherent crystal structure, shape, and lattice variations contribute to exceptional characteristics such as high-temperature resistance, corrosion resistance, abrasion resistance, low thermal expansion coefficient, high insulation, piezoelectric effects, resonant effects, and unique optical properties. These attributes make it an irreplaceable foundational material for the development of strategic and pillar industries.


The application of high-purity quartz spans diverse fields including semiconductors, photovoltaics, optical fibers, and electric light sources. Among these, the semiconductor industry holds the largest share, accounting for a significant 50% of its usage.


At the heart of semiconductor manufacturing lies chip fabrication, representing the highest value-added segment within the industry. Chip manufacturing primarily comprises four stages: single crystal growth, wafer processing and fabrication, integrated circuit (IC) production, and packaging. The most critical, complex, and demanding stages, particularly in terms of material requirements, are silicon wafer manufacturing and wafer processing.


High-purity quartz materials, with their exceptional thermal stability, acid resistance, low thermal expansion, and excellent spectral transmittance, perfectly address the stringent requirements of the semiconductor industry concerning alkali metal and heavy metal content in carrier materials. The production process necessitates a considerable volume of high-quality quartz components, including wafers, rings, plates, flanges, etched boats, diffusion furnace tubes, and cleaning tanks.




High-purity quartz used in various stages of semiconductor preparation



Application in Silicon Wafer Manufacturing


The primary application of quartz glass in silicon wafer manufacturing lies in the production of quartz crucibles, essential for the Czochralski process (CZ) used to grow single-crystal silicon ingots for wafer fabrication. Additionally, quartz cleaning containers are also utilized.



Semicorex Fused Quartz Crucible


Application in Wafer Processing


During wafer processing, various treatments like oxidation, epitaxy, lithography, etching, diffusion, chemical vapor deposition (CVD), ion implantation, and polishing are performed on silicon wafers. High-purity quartz glass, owing to its purity, high-temperature resistance, low thermal expansion, and corrosion resistance, plays a crucial role in these processes.


1) Diffusion and Oxidation: Quartz glass diffusion tubes are extensively used in these processes, along with accompanying quartz flanges. Other key components include quartz furnace tubes (for transporting quartz boats in and out of the furnace), quartz boats (for carrying silicon wafers), and quartz boat racks. Among these, quartz glass diffusion tubes are paramount, with their purity, high-temperature deformation resistance, and precise geometry directly impacting IC quality, cost, and production efficiency.


Quartz boats and racks serve as indispensable carriers for silicon wafers during diffusion, oxidation, CVD, and annealing processes. These components come in various specifications and sizes, typically available in horizontal and vertical configurations. Direct contact with silicon wafers at high temperatures necessitates the use of high-purity quartz glass with excellent thermal stability and dimensional accuracy for these components.



Semicorex Quartz Components for Diffusion Furnace


2) Etching and Cleaning: The etching process requires corrosion-resistant quartz glass materials and components, leading to a significant demand for quartz rings, quartz glass reaction chambers, and wafer supports. Additionally, the acid cleaning and ultrasonic cleaning stages utilize quartz glass baskets and cleaning tanks, respectively, capitalizing on the material’s exceptional chemical stability. Quartz bells jars are also used during the epitaxial growth of silicon.


3) Photolithography: High-purity quartz glass serves as the primary substrate material for photomasks, crucial components in the photolithography process. The procurement cost of these substrates constitutes a significant 90% of the total raw material cost for photomasks, as indicated by data from Qingyi Photomask’s prospectus. As high-precision tools for transferring circuit patterns during the manufacturing of LCDs, semiconductors, and other electronic devices, photomasks directly influence the precision and quality of the final product. This necessitates the use of ultra-high purity synthetic quartz glass ingots as the base material for photomask substrates.



In conclusion, the unique combination of properties exhibited by high-purity quartz has cemented its position as an indispensable material in the semiconductor industry. As technology advances and demands for miniaturization and performance increase, the reliance on high-quality quartz materials is only expected to grow, further solidifying its crucial role in shaping the future of electronics.**






Semicorex, as an experienced manufacturer and supplier, provides with High-purity Quartz materials for Semiconductor and Photovoltaic industry. If you have any inquiries or need additional details, please don't hesitate to get in touch with us.



Contact phone # +86-13567891907


Email: sales@semicorex.com



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