MOCVD is the key equipment

MOCVD equipment is the key equipment in the production process of the semiconductor industry, but also a large proportion of equipment investment in the semiconductor industry chain (three core processes & equipment: lithography, etching, thin film deposition), LED production line investment, MOCVD investment amount can account for up to 50%. In CVD equipment, the substrate can not be placed directly on the metal or simply placed on top of a base for epitaxial deposition, because it involves the influence of various factors such as gas flow direction (horizontal, vertical), temperature, pressure, fixation, shedding contaminants. Therefore, a base is used and the substrate is placed on a disk and then epitaxial deposition is performed on top of the substrate using CVD technology. This base is the SiC-coated graphite susceptor (which can also be called a carrier), and its structure is shown in the figure below.